2002
DOI: 10.1063/1.1472463
|View full text |Cite
|
Sign up to set email alerts
|

Microgating carbon nanotube field emitters by in situ growth inside open aperture arrays

Abstract: Multiwalled carbon nanotubes were grown using chemical vapor deposition inside small apertures having a horizontal gate and a sidewall insulator spacer. Emission currents up to 140 nA per cell at 63 V have been obtained. These arrays have exhibited a gate current as low as 2.5% of the anode current throughout the entire gate voltage range, representing the lowest gate to anode current ratio of gated nanotube emitters reported to date. We attribute this feature to the emitter geometry and method of fabrication.… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

2
16
1

Year Published

2005
2005
2009
2009

Publication Types

Select...
6
1
1

Relationship

0
8

Authors

Journals

citations
Cited by 44 publications
(19 citation statements)
references
References 12 publications
2
16
1
Order By: Relevance
“…3(b). As mentioned in [10], this convex profile is important in preventing cathode-gate ''shorting'' without resorting to more complicated fabrication processes such as sidewall protector [11,12] or gate over-etching method [8,13] that result in higher turn-on voltages. The cathode-gate spacing was¨2.0 Am, as estimated from the edge of the gate to the edge of the CNT cathode.…”
Section: Resultsmentioning
confidence: 99%
“…3(b). As mentioned in [10], this convex profile is important in preventing cathode-gate ''shorting'' without resorting to more complicated fabrication processes such as sidewall protector [11,12] or gate over-etching method [8,13] that result in higher turn-on voltages. The cathode-gate spacing was¨2.0 Am, as estimated from the edge of the gate to the edge of the CNT cathode.…”
Section: Resultsmentioning
confidence: 99%
“…4 Hsu et al fabricated two types of gated CNT field-emission arrays ͑FEAs͒ with a number of randomly oriented CNTs: one with CNTs on Si posts and the other with CNTs inside open apertures. 5,6 Other integrated gate structures with multiple aligned CNTs in each aperture have been demonstrated. [7][8][9] We have also reported integrated gate structures with multiple CNT emitters.…”
Section: Approach For Fabricating Microgated Field-emission Arrays Wimentioning
confidence: 99%
“…Therefore, in recent years micro-gated CNT arrays gain much popularity as can be seen from some of the reports. These CNT cold cathodes include a buried gate cathode with CNTs inside open trenches [11], cathodes with CNTs on Si posts and inside open apertures [12][13], micro-gated cathodes with multiple CNT emitters [14][15][16][17] and those with single CNT emitters fabricated by using electron beam lithographic patterning [18]. In contrast to multiple CNT emitters, single CNT emitters in an integrated gate structure is desirable in terms of field emission properties in a number of fields, such as microwave amplifiers and electron beam lithography.…”
Section: Introductionmentioning
confidence: 99%