Micro Total Analysis Systems 2002 2002
DOI: 10.1007/978-94-010-0295-0_35
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Microfabrication of 3D Oblique Structures by Inclined UV Lithography

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Cited by 14 publications
(18 citation statements)
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“…Several works have demonstrated that higher IDEA thickness or height of the electrodes results in higher redox amplification factors [ 49 , 54 , 126 , 127 ]. In addition, increasing the surface area of IDEA-based sensors can be achieved in various ways, such as by fabricating pillars on top of the 2D IDEAs [ 128 , 129 ], by controlling the spin-coated thickness and shape of the photoresist carbon precursor material [ 54 , 130 , 131 , 132 , 133 , 134 ], and by growing vertically aligned carbon nanotubes (VACNT) on top of planar IDEA [ 135 , 136 ]. Interestingly, without increasing the extent of the IDEA’s thickness, the integrated microchannel [ 121 , 137 , 138 ] and combination with a mesh [ 139 ] on IDEAs does improve the amplification factor due to the large surface area of the redox cycling event.…”
Section: Micro and Nano Ideamentioning
confidence: 99%
“…Several works have demonstrated that higher IDEA thickness or height of the electrodes results in higher redox amplification factors [ 49 , 54 , 126 , 127 ]. In addition, increasing the surface area of IDEA-based sensors can be achieved in various ways, such as by fabricating pillars on top of the 2D IDEAs [ 128 , 129 ], by controlling the spin-coated thickness and shape of the photoresist carbon precursor material [ 54 , 130 , 131 , 132 , 133 , 134 ], and by growing vertically aligned carbon nanotubes (VACNT) on top of planar IDEA [ 135 , 136 ]. Interestingly, without increasing the extent of the IDEA’s thickness, the integrated microchannel [ 121 , 137 , 138 ] and combination with a mesh [ 139 ] on IDEAs does improve the amplification factor due to the large surface area of the redox cycling event.…”
Section: Micro and Nano Ideamentioning
confidence: 99%
“…Han et al [16,17] developed a UV exposure process in which a photomask and a SU-8 coated substrate are in contact and the mask/SU-8 is placed on a inclined/rotated chuck. They demonstrated various 3D microstructures such as oblique angled cylinders, embedded channels, bridges, V-grooves, truncated cones, and so on (Figure 1).…”
Section: Inclined Uv Exposurementioning
confidence: 99%
“…First, a 150 nm thick chromium (Cr) layer is deposited on to a Pyrex glass wafer (Corning). After the Cr layer is patterned to define the shape of the microneedle, an SU-8 structure is formed on the Cr-patterned glass wafer by inclined UV lithography [21][22][23]. In this step, the SU-8 layer should be thicker than the desired height of the in-plane microneedle.…”
Section: In-plane Microneedlementioning
confidence: 99%