2005
DOI: 10.1063/1.1944895
|View full text |Cite
|
Sign up to set email alerts
|

Microdroplet deposition by laser-induced forward transfer

Abstract: Laser-induced forward transfer was used to deposit aluminum and nickel microdroplets onto a substrate using a Q-switched neodymium:Yttrium-aluminum-garnet laser. The droplets have diameters of a few microns, much smaller than the laser spot diameter, and are transferred at fluences slightly above the melting threshold. Scanning electron microscopy shows that the original donor film is deformed after laser irradiation, such that the film protrudes outward from the center of the laser spot. The film expands duri… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

2
94
1
1

Year Published

2006
2006
2024
2024

Publication Types

Select...
5
3

Relationship

0
8

Authors

Journals

citations
Cited by 145 publications
(98 citation statements)
references
References 8 publications
2
94
1
1
Order By: Relevance
“…With ns-LIFT this process has been shown to facilitate sublaser spot size printing. 11 In this letter we demonstrate that the same process can occur with fs-LIFT and also that the restriction of lateral heat diffusion in the film by the ultrashort time scales involved can result in significantly smaller depositions than previously reported. 3,11 The clear advantage of such fs-LIFT processing lies in the intrinsically high repetition rates from such laser systems, leading to the potential for large area direct writing.…”
mentioning
confidence: 63%
See 1 more Smart Citation
“…With ns-LIFT this process has been shown to facilitate sublaser spot size printing. 11 In this letter we demonstrate that the same process can occur with fs-LIFT and also that the restriction of lateral heat diffusion in the film by the ultrashort time scales involved can result in significantly smaller depositions than previously reported. 3,11 The clear advantage of such fs-LIFT processing lies in the intrinsically high repetition rates from such laser systems, leading to the potential for large area direct writing.…”
mentioning
confidence: 63%
“…11 In this letter we demonstrate that the same process can occur with fs-LIFT and also that the restriction of lateral heat diffusion in the film by the ultrashort time scales involved can result in significantly smaller depositions than previously reported. 3,11 The clear advantage of such fs-LIFT processing lies in the intrinsically high repetition rates from such laser systems, leading to the potential for large area direct writing. Although the results we present here involve a 1 kHz laser pulse train, the technique requires only hundreds of nanojoule pulse energies, which are achievable with megahertz repetition rate femtosecond lasers.…”
mentioning
confidence: 63%
“…This method is based on laser-induced transfer of molten nanodroplets initiated by tightly focused laser pulses. A similar approach has already been applied to the controlled fabrication of metal nanoparticles [27][28][29][30][31][32] . A more sophisticated method using a ring-shaped femtosecond laser intensity distribution has been recently applied for the generation of single Si nanoparticles from bulk Si targets 17 .…”
Section: Resultsmentioning
confidence: 99%
“…The principle of LIFT technique is as follows: The laser beam passes through the supporting transparent substrate and focuses on the thin film (the so-called donor), and then the illuminated materials can be ablated forward and deposited on the opposite substrate (so-called receiver). Generally speaking, the separation between the receiver and donor in the LIFT technique can be varied from a few micrometers (noncontact-mode LIFT) to zero (contact-mode LIFT), that can lead to different fabricated structures on the donor [32]. In this paper, the contact-mode fs-LIFT is utilized to fabricate the metamaterial of multilayer structures.…”
Section: Introductionmentioning
confidence: 99%
“…A number of materials have been patterned by the LIFT technique, such as metals [31,32], carbon nanotube [33], chalcogenide glass [34], and DNA [35], etc. The principle of LIFT technique is as follows: The laser beam passes through the supporting transparent substrate and focuses on the thin film (the so-called donor), and then the illuminated materials can be ablated forward and deposited on the opposite substrate (so-called receiver).…”
Section: Introductionmentioning
confidence: 99%