“…The great difference in contact angle of the two extreme cases provides a potentially powerful and economical platform to directly and precisely construct patterned nanostructures in aqueous solution. In general, wetting micropatterns with low contact angle contrast (≤120 o ) on smooth substrates can be formed by photolithography (Falconnet et al, 2004;Kobayashi et al, 2011), microcontact lithography (Csucs et al, 2003;Kumar et al, 1992), colloidal patterning (Michel et al, 2002;Bhawalkar et al, 2010), electron beam lithography (Wang & Lieberman, 2003;, nanoimprint lithography (Jiao et al, 2005;Zhang et al, 2006), dip-pen nanolithography (Huang et al, 2010a;Lee et al, 2006;Xu & Liu, 1997), and so on. Among these methods, photocatalytic lithography employing semiconductors to photocatalytic decompose of organic monolayer is one of the most practical techniques because it able to accurately transfer an entire photomask pattern to a target substrate at a single exposure time under environmental condition (Bearinger et al, 2009;Lee & Sung, 2004;Nakata et al, 2010;Tatsuma et al, 2002;Wang et al, 2011).…”