2003
DOI: 10.1063/1.1614882
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Microbeam of 100 keV x ray with a sputtered-sliced Fresnel zone plate

Abstract: Microfocusing of 100 keV x ray with a sputtered-sliced Fresnel zone plate (ss-FZP) has been performed at the 250-m-long beamline (20XU) of SPring-8. The ss-FZP with an outermost zone width 0.16 μm which is composed of 70 layers of alternating Cu and Al layers and having thickness ∼180 μm was fabricated and characterized. The minimum focal spot size attained for the first order focal beam was 0.5 μm with a focal distance 900 mm at a photon energy 100 keV. The total flux of the microprobe was ∼2×106 photons s−1 … Show more

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Cited by 44 publications
(27 citation statements)
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“…The m-XRF imaging analysis was carried out at BL37XU of the Super Photon Ring-8 facility in Hyogo, Japan. Details of the m-XRF system have been reported by Kamijo et al (2003) and Hokura et al (2006). Elemental maps were obtained by scanning the samples with a 10.0-keV monochromatized beam.…”
Section: M-xrf Analysismentioning
confidence: 99%
“…The m-XRF imaging analysis was carried out at BL37XU of the Super Photon Ring-8 facility in Hyogo, Japan. Details of the m-XRF system have been reported by Kamijo et al (2003) and Hokura et al (2006). Elemental maps were obtained by scanning the samples with a 10.0-keV monochromatized beam.…”
Section: M-xrf Analysismentioning
confidence: 99%
“…The key technology for the -XRF imaging of heavy elements is definitely the development of focusing optics for high-energy X-rays, and it has recently been developed at SPring-8 using a Fresnel Zone plate (FZP). 10,11 The plant samples of A. halleri ssp. gemmifera 6 were collected around an abandoned mine site in Hyogo prefecture.…”
Section: 2mentioning
confidence: 99%
“…The FZP was produced by the sputtered-slice manufacturing method. 10 A Si(Li) solid-state detector was placed in the appropriate position with respect to the direction of the incoming beam to minimize the scattering. The step size was set to 3 mm and provided some oversampling, ensuring that no area of the target was missed.…”
Section: 2mentioning
confidence: 99%
“…Hierbei werden auf einem rotierenden Draht alternierend Schichten aus stark und schwach absorbierenden Materialien deponiert, wobei die Schichtdicken dem Zonenplattenbildungsgesetz folgen. Aus dem beschichteten Draht wird anschließend eine Scheibe gewünschter optischer Tiefe extrahiert, sodass sich durch das nahezu unbegrenzte Aspektverhältnis sogar der Zugang zu extrem kleinen Wellenlängen von bis zu 0,012 nm ergibt [31]. Trotz intensiver Forschung konnte mit diesen Optiken bisher jedoch kein Fokus von wenigen Nanometern erzielt werden, was in erster Linie auf eine unzureichende Präzision der Schichtdeposition, insbesondere in Folge kumulativer Rauigkeiten und auf Beschädigungen während der Scheibenextraktion zurückzuführen war, die mit der üblichen Sputter-Slice-Präparationsmethode einhergehen [32].…”
Section: Introductionunclassified