2018
DOI: 10.1016/j.jeurceramsoc.2017.09.008
|View full text |Cite
|
Sign up to set email alerts
|

Micro-structure of ITO ceramics sintered at different temperatures and its effect on the properties of deposited ITO films

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

1
7
0
1

Year Published

2018
2018
2023
2023

Publication Types

Select...
7

Relationship

1
6

Authors

Journals

citations
Cited by 30 publications
(9 citation statements)
references
References 24 publications
1
7
0
1
Order By: Relevance
“…The reason may be the differences of tin concentration distribution in the coarse and fine grains. As same as the result shown in Figure , the distributions of coarse grains and fine grains are interval . The average grain sizes of coarse grains in samples S‐1# and S‐2# are 4.6 μm and 3.5 μm, respectively.…”
Section: Resultssupporting
confidence: 76%
See 3 more Smart Citations
“…The reason may be the differences of tin concentration distribution in the coarse and fine grains. As same as the result shown in Figure , the distributions of coarse grains and fine grains are interval . The average grain sizes of coarse grains in samples S‐1# and S‐2# are 4.6 μm and 3.5 μm, respectively.…”
Section: Resultssupporting
confidence: 76%
“…It is generally accepted that these free carriers are generated by two mechanisms: (1) tin atom substitution of indium atom and giving out one extra electron, and (2) oxygen vacancies acting as two electron donors . In this work, the same sintering temperature results in the similar solubility of tin oxide in In 2 O 3 phase, thus for the two samples, the difference in the free carriers generated by the mechanism (1) is small. Therefore, the effect of generation mechanism of free electrons on the electrical resistivity is not discussed in this part.…”
Section: Resultsmentioning
confidence: 75%
See 2 more Smart Citations
“…Indium tin oxide (ITO) is an n-type semiconductor oxide [1,2]. In recent years, due to low resistivity combined with high transparency to visible light [3,4], ITO films have been widely used in various technological areas, including flat panel displays [5,6], solar cells [7,8], gas sensors [9,10] and organic light emitting diodes [11,12]. ITO thin films are usually prepared by magnetron sputtering [13], using ITO targets as raw materials.…”
Section: Introductionmentioning
confidence: 99%