2005
DOI: 10.1007/s00170-005-2620-2
|View full text |Cite
|
Sign up to set email alerts
|

Micro-rapid-prototyping via multi-layered photo-lithography

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2008
2008
2021
2021

Publication Types

Select...
6
1

Relationship

0
7

Authors

Journals

citations
Cited by 15 publications
(2 citation statements)
references
References 1 publication
0
2
0
Order By: Relevance
“…One of the limitations of conventional photolithography, which is broadly used to manufacture two-dimensional architectures, is the difficulty to fabricate three-dimensional shapes. Due to this limitation, three-dimensional extensions of traditional photolithography such as multilayer lithography and two-photon lithography have gained interest [5][6][7][8]. However, these techniques are complex for implementation in freeform manufacturing and time-consuming.…”
Section: Introductionmentioning
confidence: 99%
“…One of the limitations of conventional photolithography, which is broadly used to manufacture two-dimensional architectures, is the difficulty to fabricate three-dimensional shapes. Due to this limitation, three-dimensional extensions of traditional photolithography such as multilayer lithography and two-photon lithography have gained interest [5][6][7][8]. However, these techniques are complex for implementation in freeform manufacturing and time-consuming.…”
Section: Introductionmentioning
confidence: 99%
“…Detrimentally, controllers with integral action are severely limited in bandwidth by the mechanical resonance which imposes a low gain-margin. Contrary to the low speed achievable with piezoelectric tube scanners, many scanning applications are demanding faster scan rates with greater accuracy and resolution, [10], [11], [12], [13], [14].…”
Section: Introductionmentioning
confidence: 99%