Micro-Raman characterization of WO3 and MoO3 thin films obtained by pulsed laser irradiation

Haro‐Poniatowski, E.; Jouanne, M.; Morhange, J. F.; Julien, C.; Diamant, R.; Fernández‐Guasti, M.; Fuentes, Gustavo A.; Alonso, J. C.

doi:10.1016/s0169-4332(97)00724-1

Cited by 81 publications

(52 citation statements)

References 14 publications

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“…For the stages with a cut-off size 1 < AED < 0.56 µm (as shown in Figure 6 for stage 5), the comparison of the Raman spectra appeared difficult. The aerosols collected revealed intense absorptions (133 w, 268 m, 328 w, 712 m, 806 s cm −1 ) corresponding to WO 3 (using literature data by Haro-Poniatowski et al [22]), indicating a high concentration of this compound. A minor contribution from another phase (low-intensity bands) was observed, and this phase was attributed to Cs 2 WO 4 aged in air.…”

Section: Cscl and The Claddingmentioning

confidence: 62%

Characterization of aerosols from RDD surrogate compounds produced by fast thermal transients

Lemma

Colle

Ernstberger

et al. 2015

Journal of Nuclear Science and Technology

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Experimental tests have been performed to characterize the aerosols representative of radiological dispersion devices (RDDs, a.k.a. "dirty bombs") by applying to chosen surrogate compound rapid high temperature transients, vaporizing the sample and forming aerosols mainly by rapid cooling of the vapour. The materials, which were tested in their non-radioactive form, had been chosen from the radioactive sources widely used in industries and nuclear medicine applications, Co, CsCl, Ir and SrTiO 3 . Our analyses permitted the characterization of the inhalable fraction of the aerosols released, and the study of the influence of cladding materials on the aerosol release and on its characteristics.

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Section: Cscl and The Claddingmentioning

confidence: 62%

Characterization of aerosols from RDD surrogate compounds produced by fast thermal transients

Lemma

Colle

Ernstberger

et al. 2015

Journal of Nuclear Science and Technology

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“…[9]). Using γ = 1.4 for WO 3 , T = 10,000 K and assuming particles with maximum and minimum masses for our system as O (16) and WO 3 (232), the predicted velocities are about 1.3 × 10 6 cm/s and 0.34 × 10 6 cm/s for O and WO 3 , respectively. Therefore, considering 3 cm as target to sample distance, the time of flight for exiting particles, molecules and atoms in the plume should be ∼6.5 µs, which is less than the measured value.…”

Section: Film Electrical Resistance Measurementsmentioning

confidence: 99%

“…Up to now several investigated deposition methods were applied to fabricate tungsten oxide films on different substrates. Among them pulsed laser deposition (PLD) is recognized as a successful deposition technique to fabricate qualify tungsten oxide thin films for different applications [2][3][4]. In the case of metal oxides, this technique is usually accompanied with oxygen to produce stoichiometric WO 3 films but, in low-pressure deposition, the composition of the films is expected to be WO x<3 and may also have a metallic nature [4].…”

Section: Introductionmentioning

confidence: 99%

“…Among them pulsed laser deposition (PLD) is recognized as a successful deposition technique to fabricate qualify tungsten oxide thin films for different applications [2][3][4]. In the case of metal oxides, this technique is usually accompanied with oxygen to produce stoichiometric WO 3 films but, in low-pressure deposition, the composition of the films is expected to be WO x<3 and may also have a metallic nature [4]. In the PLD method, ablation of a composite target in vacuum condition is a complex process and, to the best of our knowledge, sub-stoichiometric deposition by ablation of a stoichiometric WO 3 target has not been completely understood.…”

Section: Introductionmentioning

confidence: 99%

“…In the case of metal oxides, this technique is usually accompanied with oxygen to produce stoichiometric WO 3 films but, in low-pressure deposition, the composition of the films is expected to be WO x<3 and may also have a metallic nature [4]. In the PLD method, ablation of a composite target in vacuum condition is a complex process and, to the best of our knowledge, sub-stoichiometric deposition by ablation of a stoichiometric WO 3 target has not been completely understood. Since the lack of oxygen may be related to the escape of oxygen molecules from the incident plume to the substrate and/or the deposit's surface, study of both cases is of benefit.…”

Section: Introductionmentioning

confidence: 99%

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Real-time measurement of oxidation dynamics of sub-stoichiometric tungsten oxide films by pulsed laser deposition

2008

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In this study WO x films were deposited by laser ablation of ultra-pure (5N) tungsten trioxide targets onto SiO 2 or silicon substrates at 250°C temperature, 100 mTorr oxygen partial pressure and 1 × 10 −5 Torr vacuum. Surface chemical states and compositions of the deposits were determined by X-ray photoelectron spectroscopy. The results showed that deposits in oxygen partial pressure contain W 6+ with x ∼ 3.1, while vacuum-deposited films have different W states with various percentage distributions as W 4+ > W 5+ > W 6+ > W 0 , and x ∼ 1. We used fast electrical resistance measurement as a probe to study the deposition process. Film resistance as a function of deposition time in vacuum revealed some microsecond fluctuations modulated on the time variation curve of electrical resistance. We attribute these data to surface absorption and desorption of oxygen during layer deposition. Finally, the effect of the laser beam on the target's structure, surface morphology and chemical state was studied. Our results revealed that in spite of structural variation by laser irradiation, the O/W ratio remained about 3.

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Preparation and Electrochromic Properties of Nanocrystalline WO3 Thin Films Prepared by Pulsed Excimer Laser Ablation Technique

Fang

Liu

Sun

et al. 2001

phys. stat. sol. (a)

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Tungsten oxide thin films with different stoichiometry have been deposited on In 2 O 3 : SnO 2 glass (ITO) and Si wafer by pulsed laser deposition (PLD) technique at different deposition temperatures and oxygen pressure. The structural properties of WO 3 thin films were analyzed by using a scanning accessory of transmission electron microscope (STEM), X-ray diffraction (XRD), Fourier transform infrared spectrum (FT-IR), Raman spectrum (RS). Thin films deposited at 200 C on ITO showed amorphous structure, those deposited at 300 and 400 C on ITO showed nanocrystalline triclinic structure. As for samples deposited at 400 C, in which the crystals keep nanocrystalline, cyclic voltammograms at sweep rate of 50 mV/s shows that no long-term degradation was noted at least up to 1000 cycles, and durability was verified to 8000 cycles in the voltage range between --1.2 and 1.4 V. Its open and porous structure is suitable for Li-ions going into and out, and induced improved cycle stability and reversibility.

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Micro-Raman characterization of WO3 and MoO3 thin films obtained by pulsed laser irradiation

Cited by 81 publications

References 14 publications

Characterization of aerosols from RDD surrogate compounds produced by fast thermal transients

Characterization of aerosols from RDD surrogate compounds produced by fast thermal transients

Real-time measurement of oxidation dynamics of sub-stoichiometric tungsten oxide films by pulsed laser deposition

Preparation and Electrochromic Properties of Nanocrystalline WO3 Thin Films Prepared by Pulsed Excimer Laser Ablation Technique

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