Abstract:A new application of polymer Langmuir-Blodgett (LB) films which contain a photoacid generator introduced into polymer main chain as a co-monomer to draw photo patterns as a photolithographic is described here. The chemically positive-tone resist system terpolymers p (DDMA-DNMMA-AOPTs) s used here contains N-dodecylmeth acrylamide (DDMA), 1,4-dioxaspiro [4.4] nonane-2-methylmeth acrylate and 4-(allyloxy) phenyl-4-toluenesulfonate (AOPTs), which was prepared by free radical polymerization. In the terpolymers sys… Show more
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