2022
DOI: 10.5757/asct.2022.31.2.40
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Micro-Electromechanical Systems-based Sensors and Their Applications

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Cited by 22 publications
(13 citation statements)
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“…In addition, a field‐effect transistor (FET) of the biosensor platform was fabricated by using a microelectromechanical systems (MEMS), and many energies, such as the thermal energy, vacuum energy, physical energy, and sound energy, were required for the MEMS process. Therefore, the introduction of OICs onto the graphene surface progressed after the MEMS process ended [8–13] . The conjugation efficiency of OIC interfacial compounds onto graphene and the introduction efficiency of the bioprobe are limited owing to steric hinderance or the amount of the activated functional group [14] .…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…In addition, a field‐effect transistor (FET) of the biosensor platform was fabricated by using a microelectromechanical systems (MEMS), and many energies, such as the thermal energy, vacuum energy, physical energy, and sound energy, were required for the MEMS process. Therefore, the introduction of OICs onto the graphene surface progressed after the MEMS process ended [8–13] . The conjugation efficiency of OIC interfacial compounds onto graphene and the introduction efficiency of the bioprobe are limited owing to steric hinderance or the amount of the activated functional group [14] .…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, the introduction of OICs onto the graphene surface progressed after the MEMS process ended. [8][9][10][11][12][13] The conjugation efficiency of OIC interfacial compounds onto graphene and the introduction efficiency of the bioprobe are limited owing to steric hinderance or the amount of the activated functional group. [14] Therefore, OICs are required to have self-assembly, highly stable interactions, and high immobilization efficiency, and the preparation of covalent bond-based OICs is still challenging due to the need for molecular design with terminal functional groups and new patterning technologies.…”
Section: Introductionmentioning
confidence: 99%
“…After the fabrication of monolayer graphene, graphene electrodes were manufactured by a conventional MEMS processing system. , First, a photoresist (AZ5214E) with a spin coater (ACE-200) was used for the treatment of pristine graphene, and an aligner (MA-6 III, Karl-suss) was used for its fabrication. For the fabrication of GM, the reactive-ion etching (RIE) process was employed.…”
Section: Methodsmentioning
confidence: 99%
“…The electrodes for the SAb-GMFET were fabricated by a microelectromechanical system (MEMS) process [16,17]. AZ GNX-601 positive photoresist was utilized with GM in the photolithography process, and a reactive-ion etching system was used for graphene etching.…”
Section: Fabrication Of Sab-gmfetmentioning
confidence: 99%