Mg
                  B
                  2
           radio-frequency superconducting quantum interference device prepared by atomic force microscope lithography

Gregor, M.; Pleceník, T.; Praščák, M.; Mičunek, R.; Kubinec, M.; Gasparik, V.; Grajcar, M.; Kúš, P.; Plecenı́k, A.

doi:10.1063/1.2779095

Cited by 5 publications

(4 citation statements)

References 19 publications

(21 reference statements)

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“…Mijatovic et al reported fabrication of an intra-grain nanobridge dc SQUID [5]. Their bridges were defined within a large grain MgB 2 film and had a large critical current density of 5×10 7 A cm −2 at 4.2 K. Recently, an atomic force microscope (AFM) was used to make an MgB 2 rf SQUID [6]. A VTB weak link was made by AFM scratching across a prepatterned microbridge.…”

Section: Introductionmentioning

confidence: 99%

All focused ion beam fabricated MgB₂inter-grain nanobridge dc SQUIDs

Lee¹,

Hong²,

Seong³

et al. 2009

Supercond. Sci. Technol.

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We have fabricated MgB2 dc SQUIDs (superconducting quantum interference devices) containing inter-grain nanobridges as Josephson elements by a focused ion beam (FIB) etching method and measured their transport properties. The entire structure including the SQUID loop was patterned only using a FIB. The beam energy was 30 kV and the current was 0.9 nA for larger structures and 34 and 1.5 pA for the nanobridge pattern. Each bridge with a nominal width of 100 nm crossed a single grain boundary in the normal direction. The SQUID loop had a 3.1 µm × 3.1 µm hole with a 2 µm average linewidth, corresponding to an inductance of 5.1 pH. The nanobridges had a two-step transition with an increase in the resistivity of more than a decade and a substantial decrease in the critical current density. Current–voltage characteristics showed a resistively shunted junction behavior at all temperatures below Tc, which implies that the current in the inter-grain nanobridges was determined mainly by the Josephson coupling. These results are believed to be due to discernible damage on the grain boundary caused by FIB irradiation, resulting in the formation of a tunneling barrier in the boundary. The SQUID voltage showed well-behaved modulations in response to the external flux with maximum modulation depths of 80 µV at 15.2 K and 130 µV at 5.9 K.

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Section: Introductionmentioning

confidence: 99%

All focused ion beam fabricated MgB₂inter-grain nanobridge dc SQUIDs

Lee¹,

Hong²,

Seong³

et al. 2009

Supercond. Sci. Technol.

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“…The contact between the probe and the surface can be maintained at a constant force, thus allowing reliable fabrication by scratching on the surface. [1][2][3][4][5][6][7][8] However, some polymeric materials and biological samples exhibit complicated scratched behavior, such as bundle formation, due to the sliding interaction between the AFM probe and the viscoelastic surfaces, 7,8) making it difficult to cut the polymer surfaces smoothly for nanometer-scale fabrication. Furthermore, it is challenging to control the surface cutting in the case of inhomogeneous materials such as polymer blends and biological samples, due to their inhomogeneous stiffness.…”

Section: Introductionmentioning

confidence: 99%

Nanometer-scale manipulator and ultrasonic cutter using an atomic force microscope controlled by a haptic device

Iwata

Kawanishi

Sasaki

et al. 2008

Fifth International Symposium on Instrumentation Science and Technology

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We describe a nanometer-scale manipulatoion and cutting method using ultrasonic oscillation scratching. The system is based on a modified atomic force microscope (AFM) coupled with a haptic device as a human interface. By handling the haptic device, the operator can directly move the AFM probe to manipulate nanometer scale objects and cut a surface while feeling the reaction from the surface in his or her fingers. As for manipulation using the system, nanometer-scale spheres were controllably moved by feeling the sensation of the AFM probe touching the spheres. As for cutting performance, the samples were prepared on an AT-cut quartz crystal resonator (QCR) set on an AFM sample holder. The QCR oscillates at its resonance frequency (9 MHz) with an amplitude of a few nanometers. Thus it is possible to cut the sample surface smoothly by the interaction between the AFM probe and the oscillating surface, even when the samples are viscoelastics such as polymers and biological samples. The ultrasonic nano-manipulation and cutting system would be a very useful and effective tool in the fields of nanometer-scale engineering and biological sciences.

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“…The typical fabrication technique using AFM is direct scratching on surfaces with a probe. [1][2][3][4][5][6][7][8][9][10][11] The force between the probe and the surface can be maintained at constant using a feedback electronic circuit; thus, reliable fabrication by scratching on the surface has been performed.…”

Section: Introductionmentioning

confidence: 99%

Removal Method of Nano-Cut Debris for Photomask Repair Using an Atomic Force Microscopy System

Iwata

Saigo

Asao

et al. 2009

Jpn. J. Appl. Phys.

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Recently, photomask repairing techniques by scratching fabrication using an atomic force microscopy (AFM) system have been developed. However, the machining method using AFM produces cut debris during photomask repair, which induces problems and errors in photolithography. Here, we describe a novel removal method for cut debris produced in an AFM photomask repair process. The removing method is based on electrophoretic migration. A small amount of aqueous solution is dropped on a cantilever, then two electrodes placed on both sides of the cantilever form an electric field gradient around the cantilever under the liquid condition. Under the condition, the particles of cut debris produced by AFM scratching are dispersed and become spontaneously charged in the liquid, and then the particles can be consequently removed by electrophoresis migration. In particular, smaller cut particles produced by ultrasonic scratching, that is, scratching with probe oscillation, are very suitable for the removal method owing to the ease of electrophoresis migration. These techniques would be very effective in the AFM photomask repair process.

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Mg B 2 radio-frequency superconducting quantum interference device prepared by atomic force microscope lithography

Cited by 5 publications

References 19 publications

All focused ion beam fabricated MgB₂inter-grain nanobridge dc SQUIDs

All focused ion beam fabricated MgB₂inter-grain nanobridge dc SQUIDs

Nanometer-scale manipulator and ultrasonic cutter using an atomic force microscope controlled by a haptic device

Removal Method of Nano-Cut Debris for Photomask Repair Using an Atomic Force Microscopy System

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Mg B 2 radio-frequency superconducting quantum interference device prepared by atomic force microscope lithography

Cited by 5 publications

References 19 publications

All focused ion beam fabricated MgB2inter-grain nanobridge dc SQUIDs

All focused ion beam fabricated MgB2inter-grain nanobridge dc SQUIDs

Nanometer-scale manipulator and ultrasonic cutter using an atomic force microscope controlled by a haptic device

Removal Method of Nano-Cut Debris for Photomask Repair Using an Atomic Force Microscopy System

Contact Info

Product

Resources

About

All focused ion beam fabricated MgB₂inter-grain nanobridge dc SQUIDs

All focused ion beam fabricated MgB₂inter-grain nanobridge dc SQUIDs