Metrology Challenge for Monitoring Post CMP Pattern Through CD SEM

Wang, Gang; Bian, Yuyang; Liu, Biqiu; Zhang, Cong; Zhou, Wenzhan

doi:10.1109/iwaps60466.2023.10366072

2023 International Workshop on Advanced Patterning Solutions (IWAPS) 2023

DOI: 10.1109/iwaps60466.2023.10366072

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Metrology Challenge for Monitoring Post CMP Pattern Through CD SEM

Gang Wang,

Yuyang Bian,

Biqiu Liu

et al.

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Metrology Challenge for Monitoring Post CMP Pattern Through CD SEM

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