2017
DOI: 10.1134/s1063783417110087
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Methods for spin injection managing in inGaAs/GaAs/Al2O3/CoPt spin light-emitting diodes

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Cited by 6 publications
(11 citation statements)
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“…The semiconductor diode structure was formed by MOSVD at atmospheric hydrogen pressure [5,6]. The structure was three In x Ga 1−x As/GaAs quantum wells (QWs) of 10 nm width with different composition (0.1 < x < 0.25, to separate luminescence from each (QW) by wavelength) located at different distances from the surface (d s ).…”
Section: Methodsmentioning
confidence: 99%
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“…The semiconductor diode structure was formed by MOSVD at atmospheric hydrogen pressure [5,6]. The structure was three In x Ga 1−x As/GaAs quantum wells (QWs) of 10 nm width with different composition (0.1 < x < 0.25, to separate luminescence from each (QW) by wavelength) located at different distances from the surface (d s ).…”
Section: Methodsmentioning
confidence: 99%
“…The contact was a two-layer 8 nm CoPt/(1 nm Al 2 O 3 ), structure in which the magnetic CoPt layer is the source of spinpolarized carriers and the tunnel-thin Al 2 O 3 layer is necessary to enhance the spin injection efficiency. The method of production is described in detail in [5,6]. Injection nonmagnet Au/Al 2 O 3 -contacts were formed as reference ones.…”
Section: Methodsmentioning
confidence: 99%
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