2017
DOI: 10.1002/adma.201701352
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Metasurfaces and Colloidal Suspensions Composed of 3D Chiral Si Nanoresonators

Abstract: High-refractive-index silicon nanoresonators are promising low-loss alternatives to plasmonic particles in CMOS-compatible nanophotonics applications. However, complex 3D particle morphologies are challenging to realize in practice, thus limiting the range of achievable optical functionalities. Using 3D film structuring and a novel gradient mask transfer technique, the first intrinsically chiral dielectric metasurface is fabricated in the form of a monolayer of twisted silicon nanocrescents that can be easily … Show more

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Cited by 42 publications
(52 citation statements)
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“…To that end, we have fabricated chiral gold nanocrescents using hole-mask colloidal lithography using techniques described in refs. 33,35 (see Appendix D for further details). Fig.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…To that end, we have fabricated chiral gold nanocrescents using hole-mask colloidal lithography using techniques described in refs. 33,35 (see Appendix D for further details). Fig.…”
Section: Methodsmentioning
confidence: 99%
“…In order to test the analytical predictions, we perform a proof-of-principle experiment and the corresponding FDTD simulations with a coupled chiral nanoparticles-cavity system (see Appendix B for details of simulations). To ensure strong interaction of the chiral scatterer with the cavity, we will use chiral plasmonic nanocrescents [33][34][35] instead of molecules due to their large oscillator strength. Fig.…”
Section: Fdtd Simulations: Test Of a Real Systemmentioning
confidence: 99%
“…Recently our group had developed a novel fabrication technique that is able to produce HID nanostructures with nearly any desired shape/size, while maintaining high‐quality crystalline quality of the material and therefore low absorptive losses in the red region of the visible spectrum. This fabrication technique is described in further detail in Section , “Fabrication.” Essentially, the method uses a high‐quality poly‐Si film, and the desired nanoparticles are etched from this film. The newly created Si nanoparticles are then removed from the substrate and dispersed into a colloidal solution.…”
Section: Introductionmentioning
confidence: 99%
“…This fabrication technique is described in further detail in Section 2, "Fabrication." [39,40] Essentially, the method uses a highquality poly-Si film, and the desired nanoparticles are etched from this film. The newly created Si nanoparticles are then removed from the substrate and dispersed into a colloidal solution.…”
mentioning
confidence: 99%
“…To reach a new degree of freedom of light manipulation, nanophotonic structures have been gradually upgraded from two-dimensional (2D) into the three-dimensional (3D) regime. [9][10][11] Imprinting is a known method to create 2D or 3D nanostructures in photoresists, polymers, and metals, which can flow under pressure and heat. [12] While this might not be expected to work with CQD films which are granular solids, we demonstrate here that optically functional quasi-3D nanostructures can be directly imprinted into solid-state CQD films without altering key materials properties such as carrier mobility, doping, and energy gap, because the imprinting process involves no modification of the interfacial chemistry of CQDs.This will be a valuable addition to the array of state-of-art nanofabrication techniques like laser writing, focused ion beam writing, [13] and electron-beam lithography.…”
mentioning
confidence: 99%