2015
DOI: 10.1007/s11664-015-3874-6
|View full text |Cite
|
Sign up to set email alerts
|

Metallization Process of a Polyimide Surface with Palladium-Free Activation for Electronic Field Applications

Abstract: A new copper plating bath without Pd activation for electroless deposition on polyimide (PI) film is reported. The characteristics of Cu coatings on the PI via electroless plating and the effects of operating parameters on the coating coverage are discussed. The pre-treatment and plating processes are further optimized based on orthogonal experiment methods, involving variations of multiple process parameters. The electroless copper coating was characterized by scanning electron microscopy and atomic force mic… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
4
0

Year Published

2018
2018
2022
2022

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 5 publications
(4 citation statements)
references
References 18 publications
0
4
0
Order By: Relevance
“…To simplify the process of electroless copper plating and bring down the economic cost, it has become an essential issue to develop non-precious metal catalysts with simple and feasible pretreatment approaches. Nano-nickel has a low price and good catalytic ability and is expected to replace noble metal as a nucleation catalyst for electroless copper plating 18 . In previous studies, although Ni + was also used in the electroless copper plating process, it was usually added to the copper plating solution as an active agent after activation and sensitization 19 .…”
Section: Introductionmentioning
confidence: 99%
“…To simplify the process of electroless copper plating and bring down the economic cost, it has become an essential issue to develop non-precious metal catalysts with simple and feasible pretreatment approaches. Nano-nickel has a low price and good catalytic ability and is expected to replace noble metal as a nucleation catalyst for electroless copper plating 18 . In previous studies, although Ni + was also used in the electroless copper plating process, it was usually added to the copper plating solution as an active agent after activation and sensitization 19 .…”
Section: Introductionmentioning
confidence: 99%
“…The most common and widely used EL Cu bath is the alkaline HCHO bath containing Cu II , a chelating ligand such as Rochelle’s salt or EDTA, and various additives to control bath stability and the characteristics of the Cu deposit. The HCHO bath efficiently deposits good quality Cu films onto Pd-catalyzed substrates but suffers from several disadvantages. For example, the release of environmentally hazardous HCHO vapors from strongly alkaline solutions is a problem, especially at higher temperatures.…”
Section: Elementsmentioning
confidence: 99%
“…The surfaces of PI films are commonly modified through plasma treatment [5][6][7][8][9][10], ion implantation [11,12], chemical treatment [13][14][15][16][17][18], and UV/ozone treatment [19][20][21]. However, physical processes, such as plasma and ion implantation, require expensive equipment and are thus associated with high investment costs.…”
Section: Introductionmentioning
confidence: 99%