2006
DOI: 10.1016/j.mejo.2005.09.031
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Metallic nanogaps with access windows for liquid based systems

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Cited by 8 publications
(9 citation statements)
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References 14 publications
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“…Conventional electron-beam lithography can push the limit to 10 nm. While these dimensions are still too large for measuring tunneling currents through single molecules, they are well suited for investigating the electronic properties of polymers, nanocrystals, and liquids [116][117][118][119]. Photolithographically patterned leads often serve as starting points for generating smaller molecular-sized gaps by depositing additional metal on the electrodes.…”
Section: Lithographymentioning
confidence: 99%
“…Conventional electron-beam lithography can push the limit to 10 nm. While these dimensions are still too large for measuring tunneling currents through single molecules, they are well suited for investigating the electronic properties of polymers, nanocrystals, and liquids [116][117][118][119]. Photolithographically patterned leads often serve as starting points for generating smaller molecular-sized gaps by depositing additional metal on the electrodes.…”
Section: Lithographymentioning
confidence: 99%
“…Figure 1a and b illustrate the chip layout and a pair of nanoelectrodes with protection layer. For technical details on the lithographic and deposition routines we refer to our previous publication [36].…”
Section: Chip Designmentioning
confidence: 99%
“…However, these methods are not adjustable to CMOS fabrication technology. Lithographically fabricated metallic nanoelectrodes may be the most suited approach to realize this type of device. , Recently, we introduced a fabrication route for homometallic nanoelectrodes with a separation of only 3 nm utilizing e-beam lithography . In this context, we demonstrated that the final limits of patterning accuracy derive from proximity effects.…”
Section: Introductionmentioning
confidence: 99%