Platinum is one of the most important catalysts for many chemical and electrochemical reactions.1 Deposition of small amount of platinum on metal surfaces has been shown to improve the electrocatalytic properties of the metal electrodes.2 Platinum does not exhibit underpotential deposition (UPD) behavior and studies showed that electrochemical deposition of platinum on Au(111) surface from platinum complex solutions proceeded with a layer by layer growth mode to form a multilayer of Pt,3 or produced 3D clusters and a cauliflower-like Pt appearance 4 or Pt nanoparticles. 5,6 Recently a new method, which is now recognized as surface limited redox replacement reaction (SLR 3 ), was presented to prepare a Pt submonolayer/monolayer on gold surface. 7,8 This method has been widely used to form a Pt adlayer on golds for different purposes. 8,9 Since controversy exists on the platinum film electrochemically deposited by using PtCl6 2-versus PtCl4 2-, 3,4 and a single UPD Cu replacement with Pt(II) ions can yield a full monolayer but the previous elaboration was limited to PtCl 6 2-case only, 7 we investigated the redox replacement of UPD Cu adlayer on Au(111) in PtCl4 2-solutions as a function of time by using X-ray photoelectron spectroscopy (XPS), cyclic voltammetry (CV), and scanning tunneling microscopy (STM).All chemicals were of the best quality available commercially and used as received. A Au (111) single crystal was prepared as before.10 XP spectra were obtained using a Rigakudenki model XPS-7000 X-ray photoelectron spectrometer with an Mg Kα radiation. STM measurements were carried out as before. (Fig. 1B). Simultaneously Pt 4f7/2 (71.2 eV) and Pt 4f5/2 (74.5 eV) peaks 12 appeared, reflecting that the Pt/Cu SLR 3 rapidly occurred. The four other peaks in XP spectra of Cu 2p (Fig. 1A) with the binding energies of 933.4, 941, 953.2 and 962 eV are identical to those in the XP spectra region of Cu oxides and similar to the XP spectra of UPD Cu on Au reported previously. 13,14 The appearance of CuO is due to exposure of the sample electrode to the ambient environment before the XPS measurements. It was reported that only a moderate amount of copper oxide was formed on UPD Cu/Au surface even when the UPD Cu surface was deliberately oxidized by oxygen plasma.13,14 A Au 5p1/2 peak (75.8 eV) was found in the similar intensities through Fig. 1A to 1D. Another peak (66.5 eV) was also found with the same behavior as Au 5p1/2 peak in Fig 1. This peak temporarily assigned to the unidentified species existed in the chamber of XPS. One should note that the Pt 4f signal does not remain the same after replacement, Pt 4f7/2 peak intensity was found to be 5011, 5000 and 15660 cps for the replacement time of 10, 20 and 240 min, respectively. The relative amount of UPD Cu and formed Pt at different replacement time on the Au surface was determined by CuUPD : Pt 10 min : Pt 20 min : Pt 240 min = (A Cu /R Cu ) : (A Pt,10 min /R Pt ) : (A Pt,20 min / RPt) : (APt,240 min/RPt), where A is the peak area and R is the atomic sensitiv...