2010
DOI: 10.1063/1.3291053
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Metal-insulator transition in epitaxial V1−xWxO2(≤x≤0.33) thin films

Abstract: Articles you may be interested inControlling the sharpness of metal-insulator transition in epitaxial (La1−xPrx)0.67Ca0.33MnO3 (0≤x≤0.35) films Evidence of the metal-insulator transition in ultrathin unstrained V2O3 thin films Appl. Phys. Lett. 104, 071902 (2014); 10.1063/1.4866004 Comprehensive study of the metal-insulator transition in pulsed laser deposited epitaxial VO2 thin films Increased metal-insulator transition temperatures in epitaxial thin films of V 2 O 3 prepared in reduced oxygen environments Ap… Show more

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Cited by 188 publications
(169 citation statements)
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“…The reversibility of the physical properties is excellent. 9 The transition appears to be of the Mott-Hubbard type as inferred from recent work based on infrared spectroscopy, 10,11 resistivity, 12 photoemission, 13 and x-ray diffraction.…”
Section: Introductionmentioning
confidence: 96%
“…The reversibility of the physical properties is excellent. 9 The transition appears to be of the Mott-Hubbard type as inferred from recent work based on infrared spectroscopy, 10,11 resistivity, 12 photoemission, 13 and x-ray diffraction.…”
Section: Introductionmentioning
confidence: 96%
“…This structural transformation accompanies a dramatic change in the 3d-band configuration with appearance of bandgap ∼0.6 eV [3], yielding abrupt changes of both electrical resistivity on the order of 10 4 −10 and the optical transmission in the infrared region. T MI can be varied over a wide range below room temperature (RT) by aliovalent ion doping [4], external strain [5], and an electric field application [6]. These features of the MI transition in VO 2 have proved to be useful in electrical and optical switching devices [7,8].…”
Section: Introductionmentioning
confidence: 99%
“…Chemical substitution of VO 2 with aliovalent ions of W 6+ is a classical way to effectively dope electrons 14) and reduce the T MI . 15) Abrupt changes in the S-values accompanied by MI transition were observed for all the films and the transition temperature of S decreased with x in good linear relation with T MI . We examined the electronic-structure changes of V 1¹x W x O 2 films across the MI transition by means of S measurements.…”
Section: Introductionmentioning
confidence: 83%