2014
DOI: 10.1016/j.snb.2013.12.097
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Metal clusters activated SnO2 thin film for low level detection of NH3 gas

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Cited by 114 publications
(35 citation statements)
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“…Therefore, an ammonia sensor with high response, good selectivity, long-term stability and low detection limit is critical and urgently needed. So far, various materials have been explored to detect NH3 gas, such as SnO2 [2][3][4][5], V2O5 [6], WO3 [7,8], Co3O4 [9,10], ZnO [11][12][13], TiO2 [14], carbon nanotubes [15,16], graphene [17,18], etc. However, the gas response using these materials is not high enough, and the detection limit of ammonia is above ppm level.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, an ammonia sensor with high response, good selectivity, long-term stability and low detection limit is critical and urgently needed. So far, various materials have been explored to detect NH3 gas, such as SnO2 [2][3][4][5], V2O5 [6], WO3 [7,8], Co3O4 [9,10], ZnO [11][12][13], TiO2 [14], carbon nanotubes [15,16], graphene [17,18], etc. However, the gas response using these materials is not high enough, and the detection limit of ammonia is above ppm level.…”
Section: Introductionmentioning
confidence: 99%
“…Accordingly, the prepared DSH ZnTiO 3 microrod film had the electrical property of an n-type semiconductor. Therefore, the changes in resistance of the DSH ZnTiO 3 microrod film by exposure to NH 3 gas have been suggested from the reports of Hieu et al [47], Gupta et al [48], and Shi et al [49], as illustrated in Equations (2)-(4) [47][48][49]:…”
Section: Xrd Characterization Of Dsh Zntio 3 Microrodsmentioning
confidence: 99%
“…Ammonia (NH 3 ) and hydrochloric acid (HCl) are used in various industries, such as for industrial cleaning, food and chemical manufacturing, as a refrigerant (NH 3 ), and for pickling (HCl) [1][2][3]. Despite their usefulness, NH 3 and HCl are toxic substances, and inhalation or contact with the skin or eyes can cause irritation and burns [4][5][6][7][8]. According to the Occupational Safety and Health Administration (OSHA), the permissible exposure limits (calculated as 8 h time-weighted averages) of NH 3 and HCl are 50 and 5 ppm, respectively [9].…”
Section: Introductionmentioning
confidence: 99%