2024
DOI: 10.37188/lam.2024.005
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Meta-device: advanced manufacturing

Borui Leng,
Yao Zhang,
Din Ping Tsai
et al.

Abstract: Metasurfaces are one of the most promising devices to break through the limitations of bulky optical components. By offering a new method of light manipulation based on the light-matter interaction in subwavelength nanostructures, metasurfaces enable the efficient manipulation of the amplitude, phase, polarization, and frequency of light and derive a series of possibilities for important applications. However, one key challenge for the realization of applications for meta-devices is how to fabricate large-scal… Show more

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Cited by 8 publications
(5 citation statements)
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References 132 publications
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“…In practical manufacturing, the EBL and DUV lithography methods face with challenges of inefficiency, high cost and so on. NIL method can produce the proposed metasurfaces on a large scale and achieve high optical efficiency, thus represents a reliable solution for massive production [50][51][52]. In fact, there are other solutions that can multiplex the polarization channels.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…In practical manufacturing, the EBL and DUV lithography methods face with challenges of inefficiency, high cost and so on. NIL method can produce the proposed metasurfaces on a large scale and achieve high optical efficiency, thus represents a reliable solution for massive production [50][51][52]. In fact, there are other solutions that can multiplex the polarization channels.…”
Section: Resultsmentioning
confidence: 99%
“…In practical manufacturing, the electron beam lithography (EBL) and deep ultraviolet (DUV) lithography methods face with challenges of inefficiency, high cost and so on. Nanoimprint lithography (NIL) method can produce the proposed metasurfaces on a large scale and achieve high optical efficiency, thus represents a reliable solution for massive production [50][51][52].…”
Section: Introductionmentioning
confidence: 99%
“…Lin et al (2020) and Qi and Li (2020) provide insights into the compatibility of LiNbO 3 with photonic lithography techniques. Likewise, the focused ion beam (FIB) lithography technique has great potential to precisely, etch LiNbO 3 thin films (Chen et al, 2020;Jia et al, 2021;Leng et al, 2024). Such studies demonstrate that LiNbO 3 -based structures can be precisely patterned at the submicron scale, which can allow for the creation of intricate neuromorphic circuits.…”
Section: Compatibility With Advanced Fabrication Techniquesmentioning
confidence: 99%
“…The advantages of this approach, compared to other methods like rotating quarter wave plates, for measuring the Stokes parameters lies in its spatially compact design; all components of the setup are permanently installed, are not movable, and do not need to be moved [28,29]. Spatially large elements can be fabricated; the order of magnitude of a hollow waveguide array can be in the range of several centimeters, a scale that, for example, is only achievable with a high temporal manufacturing effort with metastructures [30,31].…”
Section: Samplementioning
confidence: 99%