2022
DOI: 10.1002/cctc.202200406
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Mesoporous Silica Supported Highly Dispersed GaN Catalysts Synthesized by Thermal Atomic Layer Deposition for Propane Dehydrogenation

Abstract: As a typical wide band gap semiconductor material, gallium nitride (GaN) has found extensive applications in electronic related fields. This material could also make a promising catalyst. However, due to the difficulty of synthesizing high surface area GaN, its applications in catalysis have been greatly constrained. In this work, we report a novel method of synthesizing high surface area GaN catalysts supported on mesoporous silica (MCM‐41) using thermal atomic layer deposition (ALD). Trimethyl gallium and am… Show more

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“…35 PtZn/SBA-15 and PtZn/MCM-41 are characterized by type IV isotherms, corresponding to mesoporous structures. 36,37 The amorphous PtZn/aSiO 2 also presents type IV isotherms, implying the existence of mesopores. Generally, there were no significant differences between all fresh and spent catalysts in the shape of the curve, demonstrating that the pore structures of the silica supports are well-maintained after the reactions.…”
Section: Morphology and Structure Of Silica-supported Ptzn Catalystsmentioning
confidence: 99%
“…35 PtZn/SBA-15 and PtZn/MCM-41 are characterized by type IV isotherms, corresponding to mesoporous structures. 36,37 The amorphous PtZn/aSiO 2 also presents type IV isotherms, implying the existence of mesopores. Generally, there were no significant differences between all fresh and spent catalysts in the shape of the curve, demonstrating that the pore structures of the silica supports are well-maintained after the reactions.…”
Section: Morphology and Structure Of Silica-supported Ptzn Catalystsmentioning
confidence: 99%