Mesoporous silica films—characterization and reduction of their water uptake

SBA-15 mesoporous silica free-standing thin films containing copper ions bounded via propyl phosphonate units - preparation and characterization

“…The obtained XRR curve has the shape typical for well-organised mesoporous thin films [21,35,36]. The strong dip, that can be seen at low values of a wave vector, originates from the existence of phases with two different electron densities -connected to silica walls and pores internal volume.…”

The effect of surfactant removal on continuous mesoporous ultra-thin silica films—A study by X-ray reflectivity, X-ray diffraction and Kr adsorption

“…Dourdain et al [21] suggested that full analysis of XRR curve may offer information in the average density and thickness of mesoporous silica films as well as the mass density of mesochannel walls. However, the removal of organic template may leave the intra-channel surface of mesoporous silica rich in hydrophilic silanol groups, which may absorb water as previously reported by us [22]. This water absorbency makes the mesoporous silica difficult to maintain a constant density, especially at relative humidity N25%.…”

“…XRR has been used to study morphology of ultra-thin films in semiconductor technology [17]. Only recently its usage in studying mesoporous silica films has developed [19][20][21][22][23]. Dourdain et al [21] suggested that full analysis of XRR curve may offer information in the average density and thickness of mesoporous silica films as well as the mass density of mesochannel walls.…”

Preparation of MTMS based transparent superhydrophobic silica films by sol–gel method

“…Surface modification with hydrophobic properties using the sol-gel method has been investigated during the recent years. The surface chemical modification of silica films using trimethylchlorosilane (TMCS) as a silylating agent has been reported [12][13][14][15]. Till date there are only a few reports available on the preparation of water repellent surfaces using MTMS as a precursor [16][17][18][19].…”