2013
DOI: 10.1016/j.electacta.2012.10.031
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Mesoporous Germanium formed by bipolar electrochemical etching

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Cited by 38 publications
(24 citation statements)
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“…Recently, we have reported mesoporous Ge formation by an optimized bipolar electrochemical etching of p-type Ge wafers with dimensions between 4 and 10 nm. 40,41 This substantial reduction in dimensions compared to the bulk is expected to create light emitting structures with longer wavelengths than those previously reported by Armatas. 5 In this work, we show for the first time, tunable near-infrared photoluminescence emission from mesoporous Ge, with strong direct and indirect evidences of quantum confinement effects.…”
mentioning
confidence: 90%
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“…Recently, we have reported mesoporous Ge formation by an optimized bipolar electrochemical etching of p-type Ge wafers with dimensions between 4 and 10 nm. 40,41 This substantial reduction in dimensions compared to the bulk is expected to create light emitting structures with longer wavelengths than those previously reported by Armatas. 5 In this work, we show for the first time, tunable near-infrared photoluminescence emission from mesoporous Ge, with strong direct and indirect evidences of quantum confinement effects.…”
mentioning
confidence: 90%
“…A platinum wire shaped as a spiral is used as a counter electrode. Contrary to porous Si which can be formed by DC current, the formation mesoporous Ge layers requires the use of bipolar electrochemical etching (BEE), 28,40 which means that the current should be switched from anodic to cathodic in a periodic manner. The anodic sequence induces localised etching (i.e mesopores formation), while the cathodic sequence insures the passivation of the pore walls to avoid pure chemical dissolution of the crystallites.…”
mentioning
confidence: 99%
“…Therefore crystallographic defects and surface impurities which affect the state of the surface are responsible for the resulting porous structures after etching. This technique has been applied to a broad range of materials such as silicon [104], germanium [105], gallium phosphide [103] , gallium arsenide [106] , and gallium nitride [107] and has been further developed by using light sources (especially UV light) with a technique called photo-assisted electrochemical etching [108]. The reported PL power of the porous InP is approximately 70 percent of the unetched InP prior to etching which indicates that the surface damage is not significant [109].…”
Section: Techniques Based On Wet Etchingmentioning
confidence: 99%
“…11 This late experimental exploration is mainly due to the difficulty related to fabrication of sufficiently thick homogeneous meso-PGe layers with clearly defined morphologies and it was a big technological challenge for a long time. 12 Only recently, this barrier has been overcome 13 and this breakthrough opens new possibilities for deep scientific studies of physicochemical properties and for design of various applications of the meso-PGe layers. [14][15][16] In this Letter, thermal conductivity measurements performed by photoacoustic (PA) technique on sponge-like meso-PGe layers fabricated by electro-chemical etching are reported.…”
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confidence: 99%
“…[17][18][19][20] A phenomenological phonon-confinement model initially developed for nano-Si 16 allows estimation of a mean diameter of the Ge nanocrystallites from the spectral position and the asymmetric shape of the Raman spectrum. The Raman profile calculated from the phonon-confinement model 13 is presented as a hatched blue area in Figure 1(d). The mean crystallite diameter of 3.1 nm with standard deviation of 0.68 nm was found from the model to ensure the best fitting of the high energy tail and position of the peak maximum.…”
mentioning
confidence: 99%