2011
DOI: 10.1016/j.mee.2010.12.073
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“Mesh-assisted” colloidal lithography and plasma etching: A route to large-area, uniform, ordered nano-pillar and nanopost fabrication on versatile substrates

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Cited by 42 publications
(29 citation statements)
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“…Shiu et al [77] proposed the use of colloidal lithography for superhydrophobic surfaces. Ellinas et al [78] proposed ''mesh-assisted'' colloidal lithography for more uniform large area applications on silicon and polymers. He also designed the shrinking and simultaneous etching of PS spheres on top of PMMA to create triple-scale, overhanging superoleophobic polymeric surfaces [79].…”
Section: Ordered Hierarchical Micro-nanostructured Surfacesmentioning
confidence: 99%
See 1 more Smart Citation
“…Shiu et al [77] proposed the use of colloidal lithography for superhydrophobic surfaces. Ellinas et al [78] proposed ''mesh-assisted'' colloidal lithography for more uniform large area applications on silicon and polymers. He also designed the shrinking and simultaneous etching of PS spheres on top of PMMA to create triple-scale, overhanging superoleophobic polymeric surfaces [79].…”
Section: Ordered Hierarchical Micro-nanostructured Surfacesmentioning
confidence: 99%
“…A plasma etching step subsequently modifies one of the materials by nanoroughening and appropriate chemical modification and allows selective protein binding on one of the two materials. This way Bayati et al [169] allowed selective protein adsorption on SiO 2 over Si, creating self-aligned'' biomolecule spots on the patterns formed, while Malainou et al recently extended this concept to nanoscale patterns using colloidal lithography [78,170]. The same authors also transferred this concept to glass, showing selective protein adsorption on rough photoresist patterns on glass.…”
Section: Biomolecule and Other Molecule Adsorption Control Fouling Amentioning
confidence: 99%
“…ACCEPTED MANUSCRIPT 28 Interesting results were recently obtained by Ellinas et al [77,78] Figure 15. In order to fabricate amphiphobic surfaces, an additional fluorocarbon plasma deposition was carried out using C 4 F 8 .…”
Section: Accepted Manuscriptmentioning
confidence: 81%
“…For PMMA, various approaches have been used to turn its weakly hydrophobic nature into super-hydrophobic, including replicating, imprinting, and mesh-assisted via mold [2][3][4][5]; lithography and soft-lithography [6][7][8][9], plasma etching [10][11][12][13][14], and vapor deposition [15]; solutions of mixing two or more different kinds of powders [16][17][18][19][20][21][22][23][24][25][26], and different powder grain sizes [27][28][29][30]; fluoride coated surfaces [31,32]; and electrospinning and electrospraying [33]. In contrast, we have been concentrated on developing lower cost and simpler methods.…”
Section: Introductionmentioning
confidence: 99%