We have designed an automatic complex equipped by a Cascade Microtech MPS150 micro-probing station and a PXIe-4143 source measure unit from National Instruments Corporation to investigate the electrical properties of metal/insulator/metal sandwich structures. We have also succeeded in implementing conditions for the current-voltage characteristics measurements and in simulating procedures for the multiple reading/writing of digital information by means of resistive switching inside the nanostructured layers. We have studied anodized-titanium-dioxide-based Ti/TiO2-NT/Au structures with diameter of 100 micrometers, synthesized by the mask method. For the micromemristors produced, we have estimated the resistance in the low-(<10 kOhm) and high-ohmic (> 50 kOhm) states.