2019
DOI: 10.1109/led.2019.2904279
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Memory Switching and Threshold Switching in a 3D Nanoscaled NbOX System

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Cited by 28 publications
(17 citation statements)
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“…The forming step has previously been attributed to a soft breakdown process that generates a channel of crystalline NbO 2 within the oxide film 41,46,48 , which exhibits Joule-heating-driven NDR that underlies the threshold switching behavior 40,41,49 . During switching, ~2 µA threshold current is observed, which is much lower than devices of NbO 2 /TiN reported previously 47,50 (see Supplementary Fig. 1).…”
Section: Resultscontrasting
confidence: 60%
See 1 more Smart Citation
“…The forming step has previously been attributed to a soft breakdown process that generates a channel of crystalline NbO 2 within the oxide film 41,46,48 , which exhibits Joule-heating-driven NDR that underlies the threshold switching behavior 40,41,49 . During switching, ~2 µA threshold current is observed, which is much lower than devices of NbO 2 /TiN reported previously 47,50 (see Supplementary Fig. 1).…”
Section: Resultscontrasting
confidence: 60%
“…The memristor devices used in this study are based on a 3D vertical metal–insulator–metal structure similar to those reported by us earlier 47 . The device has a titanium nitride (TiN) top electrode, a niobium oxide (NbO x ) switching layer, and a poly-Si bottom electrode (see Methods for the details of fabrication processes).…”
Section: Resultsmentioning
confidence: 85%
“…The four voltage values (V th+ , V hold+ , V th− , and V hold− ) increase along with the increase of CC, while the device still kept threshold-switching property even when CC is up to 100 mA. As a comparison, the working current of the other research was low to a high microamps level (Wang et al, 2018;Lee et al, 2020;Gao et al, 2017;Park et al, 2018;Luo et al, 2019), whereas the working current of the Ti/NbO x /Ti/Pt device has been increased by 10 times or more. This indicated that the Ti/ NbO x /Ti/Pt device has the great potential to drive RRAM under ultra-large working current.…”
Section: Resultsmentioning
confidence: 75%
“…1a after electroforming. By the electroforming process, an oxygen-deficient filamentary conducting channel is formed 31 34 . Among the filament, a highly oxygen deficient part (i.e., the anode interface) was crystallized to an insulating NbO 2 as the NbO 2 phase is thermodynamically stable.…”
Section: Resultsmentioning
confidence: 99%