2012
DOI: 10.7567/jjap.51.104102
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Memory Conductance Switching in a Ni–Ti–O Compound Thin Film

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Cited by 7 publications
(4 citation statements)
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“…[http://dx.doi.org/10.1063/1.4884303] Electrically induced resistive switching phenomena between two different resistance states, a high resistance state (HRS) and a low resistance state (LRS), is often observed in various metal-I-metal structures, in which the "I" layer ranges from the insulating metal oxides, [1][2][3][4] to more complex materials, [5][6][7][8][9][10][11] such as organic matter. 12,13 Besides their intriguing physics, this phenomenon has attracted considerable attention in the memory industry due to its potential application in next-generation nonvolatile memories, which are often abbreviated as ReRAM or RRAM.…”
Section: Author(s) All Article Content Except Where Otherwise Notedmentioning
confidence: 99%
“…[http://dx.doi.org/10.1063/1.4884303] Electrically induced resistive switching phenomena between two different resistance states, a high resistance state (HRS) and a low resistance state (LRS), is often observed in various metal-I-metal structures, in which the "I" layer ranges from the insulating metal oxides, [1][2][3][4] to more complex materials, [5][6][7][8][9][10][11] such as organic matter. 12,13 Besides their intriguing physics, this phenomenon has attracted considerable attention in the memory industry due to its potential application in next-generation nonvolatile memories, which are often abbreviated as ReRAM or RRAM.…”
Section: Author(s) All Article Content Except Where Otherwise Notedmentioning
confidence: 99%
“…NiTiO 3 (NTO) is a technologically relevant material proven suitable within photo catalysis, high-k dielectrics and non-volatile memory [1][2][3][4][5]. In addition, ab initio calculations predict ferroelectricity and crystal structure dependent weak ferromagnetism, potentially suitable for sensor, microwave and spintronic applications [6].…”
Section: Introductionmentioning
confidence: 99%
“…Ferroelectricity and weak ferromagnetism have indeed been observed in bulk samples of NTO as well [14], but the report did not discuss the crystal symmetry of the samples. Thin films of NTO have previously been made by various deposition techniques, including aerosol-assisted CVD [2], sol-gel methods [3,[15][16][17][18], dip-coating [19] and RF-sputtering [4,5], as well as with the previously mentioned pulsed laser deposition [10][11][12]. Especially for the latter technique, compositional control seems to be challenging.…”
Section: Introductionmentioning
confidence: 99%
“…Nonvolatile memory (NVM) technologies have been widely implemented for data storage of mobile electronics due to their low power consumption, and resistive random access memory (ReRAM) has recently attracted a considerable amount of attention for use as next-generation NVM. ReRAM offers several potential advantages, including low power consumption, simple metal-insulating metal oxide–metal (MIM) structure, nonvolatility, faster access speed, higher density, and easier fabrication processes. Numerous ReRAM materials, including SrZiO 3 , ZnO, , NiO, , Ni–Ti–O, Al 2 O 3 , and TiO 2 , , exhibit resistive switching memory characteristics that make them suitable for use in next-generation memory devices. Although many of these materials have been studied, tungsten oxide (WO 3 )-based resistive switching memory (ReRAM) has attracted a considerable amount of attention because it exhibits promising properties in terms of scalability, switching speed, endurance, retention, CMOS compatibility, etc. …”
Section: Introductionmentioning
confidence: 99%