2009
DOI: 10.1016/j.mee.2008.09.042
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Megasonic cleaning of wafers in electrolyte solutions: Possible role of electro-acoustic and cavitation effects

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Cited by 41 publications
(19 citation statements)
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“…Still, pressures may be of the order of 10 3 -10 4 bars. The range of driving pressures analysed here is the typical operating range of megasonic cleaning devices (Kapila et al 2006;Holsteyns et al 2008;Minsier & Proost 2008;Ahn et al 2009;Keswani et al 2009). An uncontrolled radiation by cavitation bubble fields will result in mechanical failure, when the high peak energies of the radiated sound containing highfrequency components drive unwanted mechanical oscillations.…”
Section: Discussionmentioning
confidence: 99%
“…Still, pressures may be of the order of 10 3 -10 4 bars. The range of driving pressures analysed here is the typical operating range of megasonic cleaning devices (Kapila et al 2006;Holsteyns et al 2008;Minsier & Proost 2008;Ahn et al 2009;Keswani et al 2009). An uncontrolled radiation by cavitation bubble fields will result in mechanical failure, when the high peak energies of the radiated sound containing highfrequency components drive unwanted mechanical oscillations.…”
Section: Discussionmentioning
confidence: 99%
“…Understanding the driving mechanisms of acoustic streaming patterns within acoustofluidic devices is important in order to precisely control it for the enhancement or suppression of acoustic streaming for applications such as particle/cell manipulation [1-8], heat transfer enhancement [9][10][11][12], noncontact surface cleaning [13][14][15][16][17], microfluidic mixing [18][19][20][21][22][23][24][25][26][27], and transport enhancement [28][29][30][31][32][33][34][35].…”
Section: Introductionmentioning
confidence: 99%
“…INTRODUCTION Acoustic streaming is steady fluid motion driven by the absorption of acoustic energy due to the interaction of acoustic waves with the fluid medium or its solid boundaries. Understanding the driving mechanisms of acoustic streaming patterns within acoustofluidic devices is important in order to precisely control it for the enhancement or suppression of acoustic streaming for applications such as particle/cell manipulation [1-8], heat transfer enhancement [9-12], noncontact surface cleaning [13][14][15][16][17], microfluidic mixing [18][19][20][21][22][23][24][25][26][27], and transport enhancement [28][29][30][31][32][33][34][35].In most bulk micro-acoustofluidic particle and cell manipulation systems of interest, the acoustic streaming fields are dominated by boundary-driven streaming [36], which is associated with acoustic dissipation in the viscous boundary layer [37]. Theoretical work on boundary-driven streaming was initiated by Rayleigh [38], and developed by a series of modifications for particular cases [39][40][41][42][43][44], which have paved the fundamental understanding of acoustic streaming flows.…”
mentioning
confidence: 99%
“…Sonochemical cleaning has proved to be particular effective, e.g., after preoxidation, pre-chemical vapor deposition, pre-epitaxial growth, postash and post-chemical mechanical polishing of Si wafers. It is commonly believed that the cleaning removes contaminating additives from the wafer surface through acoustic cavitation and acoustic streaming although the physics behind the ultrasonic-induced cleaning process is still not completely understood and the precise cleaning mechanisms are still the subject of debate [3,4]. The frequency range of the waves used in this process is rather wide, typically in the kHz-MHz range.…”
Section: Introductionmentioning
confidence: 99%