The
photoelectrochemical performance of thin film photoelectrodes
can be impacted by deviations from the stoichiometric composition,
both at the macroscale and at the nanoscale. This issue is especially
pronounced for the class of ternary compounds that are currently investigated
for simultaneously achieving the optoelectronic characteristics and
chemical stability required for solar fuel generation. Here, we combine
macroscopic photoelectrochemical testing with atomic force microscopy
(AFM) and scanning transmission X-ray microscopy (STXM) to reveal
relationships between photoelectrochemical activity, nanoscale morphology,
and local chemical composition in copper vanadate (CVO) thin films
as a model system. For films with varying Cu/(Cu + V) ratios around
the ideal stoichiometry of stoiberite Cu5V2O10, AFM resolves submicrometer morphology variations, which
correlate with variations of the Cu content resolved by STXM. Both
stoichiometric and Cu-deficient films exhibit a clear photoresponse,
which indicates electronic tolerance to reduced Cu content. While
both films exhibit homogeneous O and V content, they are also characterized
by local regions of Cu enrichment and depletion that extend beyond
individual grains. By contrast, Cu-rich photoelectrodes exhibit a
tendency toward CuO secondary phase formation and a significantly
reduced photoelectrochemical activity, indicating a significantly
poor electronic tolerance to Cu-enrichment. These findings highlight
that the average film composition at the macroscale is insufficient
for defining structure–function relationships in complex ternary
compounds. Rather, correlating microscopic variations in chemical
composition to macroscopic photoelectrochemical performance provides
insights into photocatalytic activity and stability that are otherwise
not apparent from pure macroscopic characterization.