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2011
DOI: 10.1149/1.3572325
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Mechanisms of Difficulty to Correlate the Leakage Current of High-k Capacitor Structures with Defect States Detected Spectroscopically by the Thermally Stimulated Current Technique

Abstract: Historically, it has been difficult to correlate the leakage current of capacitor structures involving high-k dielectric materials and defect states detected spectroscopically by the thermally stimulated current (TSC) technique. Four mechanisms are proposed and solutions are explained with tantalum oxide as an example. One of the mechanisms is the limitation of the TSC technique itself because of the presence of a parasitic current due to the bias voltage used. This can be solved by migrating to more advanced … Show more

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Cited by 3 publications
(4 citation statements)
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“…Previously in 2011, the author points out that these two mechanisms actually can happen simultaneously and a unified Schottky-Poole-Frenkel model can be used to explain some observed experimental data. 5 The unified Schottky-Poole-Frenkel model is actually similar to a simple model involving two back-to-back Schottky diodes suggested by Lai and Lee in 1999. 6 The principal difference is the addition of a non-linear resistor RNL, which can be used to represent the Poole-Frenkel effect.…”
Section: Theorymentioning
confidence: 78%
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“…Previously in 2011, the author points out that these two mechanisms actually can happen simultaneously and a unified Schottky-Poole-Frenkel model can be used to explain some observed experimental data. 5 The unified Schottky-Poole-Frenkel model is actually similar to a simple model involving two back-to-back Schottky diodes suggested by Lai and Lee in 1999. 6 The principal difference is the addition of a non-linear resistor RNL, which can be used to represent the Poole-Frenkel effect.…”
Section: Theorymentioning
confidence: 78%
“…1b. J RNL = J PF [5] Lai and Lee analyzed capacitor structures involving an asdeposited tantalum oxide film which is very leaky; 6 according to the model shown in Fig. 1b, RNL is approximately zero for their work.…”
Section: Theorymentioning
confidence: 99%
“…The Schottky mechanism does not involve defect states in the bulk of the high-k dielectric; however, the Poole-Frenkel mechanism involves defect states in the bulk of the high-k dielectric. Previously in 2011, the author points out that these two mechanisms actually can happen simultaneously and a unified Schottky-Poole-Frenkel model can be used to explain some observed experimental data (5). The unified Schottky-Poole-Frenkel model is actually similar to a simple model involving two back-to-back Schottky diodes suggested by Lai and Lee in 1999 (6).…”
Section: Theorymentioning
confidence: 89%
“…The author believes that quite frequently the P-F and the Schottky mechanisms happen simultaneously and so a unified Schottky-Poole-Frenkel model, as shown in Fig. 1, is quite frequently needed to explain experimental results (2). In Fig.…”
Section: Introductionmentioning
confidence: 99%