Mechanisms of Difficulty to Correlate the Leakage Current of High-k Capacitor Structures with Defect States Detected Spectroscopically by the Thermally Stimulated Current Technique
Abstract:Historically, it has been difficult to correlate the leakage current of capacitor structures involving high-k dielectric materials and defect states detected spectroscopically by the thermally stimulated current (TSC) technique. Four mechanisms are proposed and solutions are explained with tantalum oxide as an example. One of the mechanisms is the limitation of the TSC technique itself because of the presence of a parasitic current due to the bias voltage used. This can be solved by migrating to more advanced … Show more
“…Previously in 2011, the author points out that these two mechanisms actually can happen simultaneously and a unified Schottky-Poole-Frenkel model can be used to explain some observed experimental data. 5 The unified Schottky-Poole-Frenkel model is actually similar to a simple model involving two back-to-back Schottky diodes suggested by Lai and Lee in 1999. 6 The principal difference is the addition of a non-linear resistor RNL, which can be used to represent the Poole-Frenkel effect.…”
Section: Theorymentioning
confidence: 78%
“…1b. J RNL = J PF [5] Lai and Lee analyzed capacitor structures involving an asdeposited tantalum oxide film which is very leaky; 6 according to the model shown in Fig. 1b, RNL is approximately zero for their work.…”
Historically, there is a controversy regarding the current-voltage (I-V) characteristics of thin film MIM (metal-insulator-metal) capacitors, which is quite frequently modeled by either the Schottky model or the Poole-Frenkel model. In this paper, the author points out that the two models actually can be unified. The physics underlying this model involves a non-uniform distribution of deep donor defect states such that a very large quantity of defect states exist at the two interface of the MIM capacitor while the density of defect states in the insulator bulk is relatively low, resulting in an M/n-i-n/M structure. This unified Schottky-Poole-Frenkel model can be further extended to include other effects like space charge limited current and tunneling. The effect of trap limited space charge limited current is also discussed. Examples of the application of this theory will be provided for MIM capacitors based on various high-k dielectric materials like tantalum oxide, titanium oxide, zirconium oxide and aluminum oxide.
“…Previously in 2011, the author points out that these two mechanisms actually can happen simultaneously and a unified Schottky-Poole-Frenkel model can be used to explain some observed experimental data. 5 The unified Schottky-Poole-Frenkel model is actually similar to a simple model involving two back-to-back Schottky diodes suggested by Lai and Lee in 1999. 6 The principal difference is the addition of a non-linear resistor RNL, which can be used to represent the Poole-Frenkel effect.…”
Section: Theorymentioning
confidence: 78%
“…1b. J RNL = J PF [5] Lai and Lee analyzed capacitor structures involving an asdeposited tantalum oxide film which is very leaky; 6 according to the model shown in Fig. 1b, RNL is approximately zero for their work.…”
Historically, there is a controversy regarding the current-voltage (I-V) characteristics of thin film MIM (metal-insulator-metal) capacitors, which is quite frequently modeled by either the Schottky model or the Poole-Frenkel model. In this paper, the author points out that the two models actually can be unified. The physics underlying this model involves a non-uniform distribution of deep donor defect states such that a very large quantity of defect states exist at the two interface of the MIM capacitor while the density of defect states in the insulator bulk is relatively low, resulting in an M/n-i-n/M structure. This unified Schottky-Poole-Frenkel model can be further extended to include other effects like space charge limited current and tunneling. The effect of trap limited space charge limited current is also discussed. Examples of the application of this theory will be provided for MIM capacitors based on various high-k dielectric materials like tantalum oxide, titanium oxide, zirconium oxide and aluminum oxide.
“…The Schottky mechanism does not involve defect states in the bulk of the high-k dielectric; however, the Poole-Frenkel mechanism involves defect states in the bulk of the high-k dielectric. Previously in 2011, the author points out that these two mechanisms actually can happen simultaneously and a unified Schottky-Poole-Frenkel model can be used to explain some observed experimental data (5). The unified Schottky-Poole-Frenkel model is actually similar to a simple model involving two back-to-back Schottky diodes suggested by Lai and Lee in 1999 (6).…”
Historically, there is a controversy regarding the current-voltage (I-V) characteristics of thin film MIM (metal-insulator-metal) capacitors, which is quite frequently modeled by either the Schottky model or the Poole-Frenkel model. In this letter, the author points out that the two models actually can be unified. The physics underlying this model involves a non-uniform distribution of defect states such that a very large quantity of defect states exist at the two interface of the MIM capacitor while the density of defect states in the insulator bulk is relatively low, resulting in an M/n-i-n/M structure. This unified Schottky-Poole-Frenkel model can be further extended to include other effects like space charge limited current, tunneling, etc. Evidence supporting this theory will be provided.
“…The author believes that quite frequently the P-F and the Schottky mechanisms happen simultaneously and so a unified Schottky-Poole-Frenkel model, as shown in Fig. 1, is quite frequently needed to explain experimental results (2). In Fig.…”
Historically, there has been a controversy regarding whether the leakage current versus voltage (I-V) relationship is governed by the Schottky mechanism or by the Poole-Frenkel (P-F) mechanism for several decades. For the P-F mechanism, the I-V characteristics is expected to be symmetrical. In this paper, the author points out that there is an extra mechanism for symmetrical I-V characteristics.
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