2001
DOI: 10.1007/bf02373561
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Mechanisms of corrosion in surface layers at solid-solution interfaces

Abstract: This review is focussed on solids in the broad categories of oxides, both simple (e.g. binary) and complex (e.g. silicates, aluminosilicates, titanates), and sulfides as ceramics, minerals and surface coatings. Mechanisms of surface reaction, corrosion and leaching associated with protons, hydroxide, water and simple cations and anions are considered. A variety of mechanisms that have some generality in determining the kinetics and reaction products at the solid-solution interfaces is illustrated. The focus of… Show more

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Cited by 3 publications
(3 citation statements)
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“…This type of expression was developed over 100 years ago. , The dissolution process has become critical for modeling the release of drugs in the pharmaceutical industry . However, the dissolution process is also important for modeling the removal of foulants in the chemical and food processing industries , and for understanding corrosion …”
Section: Theorymentioning
confidence: 99%
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“…This type of expression was developed over 100 years ago. , The dissolution process has become critical for modeling the release of drugs in the pharmaceutical industry . However, the dissolution process is also important for modeling the removal of foulants in the chemical and food processing industries , and for understanding corrosion …”
Section: Theorymentioning
confidence: 99%
“…8 However, the dissolution process is also important for modeling the removal of foulants in the chemical and food processing industries 9,10 and for understanding corrosion. 11 For the dissolution of a solid into a falling liquid film, earlier studies have focused on processes in which the dissolved substance does not penetrate deeply into the falling film. 12−15 This is only true for situations with short contact times, but this assumption makes it possible to simplify the boundary condition for the liquor−gas interface and thereby enables an analytical solution for laminar flow.…”
Section: ■ Introductionmentioning
confidence: 99%
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