A trench split gate metal-oxidesemiconductor field-effect transistor (MOSFET) inductive switching is analyzed by adopting six-terminal method. Owing to the buried source terminal in the trench oxide, conventional three-terminal (gate, source, and drain) analysis has a limitation for investigating the detailed time-dependent current flow in the drift region, channel, as well as each terminal. However, a mixed-mode simulation tools enable us to look into the complicated current flow mechanisms in the device by dividing the gate terminal into the gate-to-source and the gate-to-drain terminals and the source terminal into the n+, the p+, and the shielded source terminals. The six-terminal method enables us to understand the fundamental turn-on and turn-off switching mechanisms that we have not found out so far from the measurement. Index Terms-Inductive switching, medium voltage, power metal-oxide-semiconductor field-effect transistors (MOSFETs), split gate. I. INTRODUCTION M EDIUM voltage power metal-oxide-semiconductor field-effect transistors (MOSFETs) have been mainly targeted at dc-dc power supplies, and ac-dc converters [1]-[3]. To reduce the specific resistance (R sp ) and the breakdown voltage (BV) by enhancing the drift region's doping concentration, the depth of the trench gate structure was prolonged toward the deep drift region. The poly gate in the deep trench helps the drift region to form a trapezoidal electric field shape acting as a field plate. Although the poly gate below the channel (in the deep trench) is surrounded by relatively thick oxide which would be able to lower the parasitic capacitance value, the gate-to-drain capacitance (C GD.Sh ) will not be ignorable owing to the large shielded area [1]. For this reason, the poly field plate is separated from the poly gate by a thick oxide (split-gate) and it is connected to the source terminal instead of the gate as shown in Fig. 1(a). Therefore, a split-