2014
DOI: 10.1016/j.surfcoat.2014.04.066
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Mechanisms for compositional variations of coatings sputtered from a WS2 target

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Cited by 29 publications
(19 citation statements)
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“…The coating deposited with −200 V has a significantly lower thickness equal to 45 nm, which results from shorter deposition time rather than from the bias voltage itself. The WS 2 monolayer, by contrast, is seen to have a uniform thickness and a columnar microstructure similar to that observed by other researchers [21,22]. The images of DLC-WS 2 coatings do not allow us to distinguish separate layers, although the DLC macroparticles can be noticed.…”
Section: Coating Structure and Compositionsupporting
confidence: 79%
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“…The coating deposited with −200 V has a significantly lower thickness equal to 45 nm, which results from shorter deposition time rather than from the bias voltage itself. The WS 2 monolayer, by contrast, is seen to have a uniform thickness and a columnar microstructure similar to that observed by other researchers [21,22]. The images of DLC-WS 2 coatings do not allow us to distinguish separate layers, although the DLC macroparticles can be noticed.…”
Section: Coating Structure and Compositionsupporting
confidence: 79%
“…Except for the WS 2 monolayer and DLC-WS 2 d, it can be observed that the amount of the Al is lower than for DLC. A larger amount of Al adherent can be noticed for the WS 2 monolayer, confirming the degradation of its tribological properties in the wet environment [21] and rapid wear caused by hard AlSi alloy. For DLC-WS 2 c and d, crater and abrasive flank wear occurred.…”
Section: Dlc-ws 2 Multilayersmentioning
confidence: 58%
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“…One reason for the significantly lower Si content within our coatings with respect to the compound targets are the scattering effects promoted by the high deposition pressure of 1 Pa. These effects are not that pronounced for heavier elements, such as molybdenum [31]. The coatings prepared with the three elementary targets (Si: 3 inch, B: 2 inch, Mo: 2 inch) guarantees increased Si and B contents in comparison to the previous target set up.…”
Section: Resultsmentioning
confidence: 81%
“…This is especially clear for the coatings deposited at high temperature, where the W content is almost constant, regardless of N content. It can be noted that the S/W ratio is well below 2 for all coatings, also those without N. Substoichiometry with respect to S is common in coatings deposited by sputtering from a WS 2 target, and the resulting sulphide can be described as WS x with x b 2 [14][15][16]. The presence of contaminations was checked by XPS depth profiles, and the W-S-N coatings contain approximately 2 at.% of O, and no C. More O and some C was detected for the W-S coatings, which are more porous and thus have adsorbed atmospheric contaminations not only on the outermost surface.…”
Section: Chemical Structural and Mechanical Propertiesmentioning
confidence: 90%