2021
DOI: 10.1016/bs.coac.2021.01.003
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Mechanisms and byproduct formation in the application of chlorine dioxide

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Cited by 9 publications
(25 citation statements)
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“…Yields of around 70% chlorite for RA and more than 80% for Pd and MPd indicate that electron transfer reactions are the primary reaction. Therefore, the source of FAC formation can be reactions such as those between different chlorine species. , …”
Section: Resultsmentioning
confidence: 99%
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“…Yields of around 70% chlorite for RA and more than 80% for Pd and MPd indicate that electron transfer reactions are the primary reaction. Therefore, the source of FAC formation can be reactions such as those between different chlorine species. , …”
Section: Resultsmentioning
confidence: 99%
“…The use of oxidation processes has significantly improved the performance of micropollutant removal in water and wastewater treatment. Chlorine dioxide (ClO 2 ) is a selective oxidant capable of degrading micropollutants in water and wastewater treatment whose potential has gained attention in the recent two decades. ClO 2 primarily reacts via electron transfer with electron-rich moieties . Thus, the removal efficiency of ClO 2 oxidation toward micropollutants depends mainly on the reactive functional group of these compounds.…”
Section: Introductionmentioning
confidence: 99%
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“…22 The membrane damage could be explained by the reaction of ClO 2 with membrane proteins (note that the double bonds of lipids hardly react with ClO 2 (ref. 18)). Previous research has shown that ClO 2 reacts with specific amino acids ( e.g.…”
Section: Introductionmentioning
confidence: 99%
“…16,17 Previous studies indicated that the yield of FAC displays a very strong structure dependency. 18 While phenol yields FAC, Hupperich et al 2020 observed that the reaction of the phenol derivative vanillin with ClO 2 resulted in the formation of ≈50% ClO 2 − and ≈50% Cl − as major products, whereby no FAC was observed. 17 Yet, a mechanistic understanding of this observation is lacking.…”
Section: Introductionmentioning
confidence: 99%