2003
DOI: 10.1557/proc-788-l7.11
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Mechanism of Surfactant Removal from Ordered Nanocomposite Silica Thin Films by Deep-UV Light Exposure

Abstract: In recent years, methods have been developed for the generation of complex ordered nanocomposite materials through organic templating of inorganic structures. One approach involves preparation of composite materials by an evaporation induced self-assembly process involving organization of organic surfactants and formation of inorganic silica from soluble precursors. Recently, we have shown that deep-UV light (185–254nm) is efficient at removing the surfactant microphase for a routine production of well-ordered… Show more

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Cited by 5 publications
(7 citation statements)
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“…The surfactant templates were removed by a photocalcination procedure. 35,36 In this process films were exposed to 185-254 nm UV light for about 90 min to ensure complete surfactant removal. 36 Membrane Preparation.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…The surfactant templates were removed by a photocalcination procedure. 35,36 In this process films were exposed to 185-254 nm UV light for about 90 min to ensure complete surfactant removal. 36 Membrane Preparation.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…UV/ozone treatment was performed to photocalcine the organic ligands. 50,51 The time of exposure controlled the surface occupancy of the CH3 and CF3 groups, thereby adjusting the apparent contact angle, θ R , while maintaining constant porosity, Φs, and roughness AFM/SEM/TEM. Various microscopies were used to investigate the surface and bulk structure of the SH films.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…Indeed the surfactant is the key component which dictates after removal the porosity and the structure of the silica backbone. , If in the early stages, powdered samples were the sole materials that were synthesized, very rapidly many researchers tried to design such materials in thin films. Pioneered by J. Brinker the most common technique to make highly organized thin films is the EISA (evaporation induced self assembly) process, which consists of fostering the self-assembly of the surfactant during the fast evaporation of a volatile solvent such as ethanol together with the concomitant condensation of the silica network in acidic condition under controlled relative humidity. Highly ordered crystalline thin films have thus be synthesized with the ultimate goal to produce mesoporous materials by removing the surfactant either by calcination, solvent extraction or UV-light exposure. Accessing the porosity is indeed of paramount importance in many applications such as dye sensitive solar cells (low-k) dielectric materials, for functionalizing the pore surface or to address the condensation of fluids inside the pores . So far hydrocarbon surfactants (cationic, nonionic, and anionic) were mostly used as templates because they are the most common ones available on the market at a cheap price.…”
Section: Introductionmentioning
confidence: 99%