Mechanism of Production of CN(X2Σ+) Radicals from the Decomposition Reaction of CH3CN with Microwave Discharge Flow of Ar

Ito, Hajime; Koshimura, Katsuaki; Yamamoto, Ayumi; Tsudome, Hiroki; Zamri, Nurul Izzaty Binti; Araki, Hitoshi; Wada, Akira

doi:10.1007/s11090-014-9529-1

Cited by 3 publications

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“…The outline of the method used to identify the dominant active species of Ar plasma is as follows. [23][24][25][26][27][28][29][30][31] The density of Ar( 3 P 0 ) atoms, n M , is measured by the laser-induced fluorescence (LIF) spectroscopy of the 3 P 1 -3 P 0 transition whose intensity is calibrated against the Rayleigh scattering intensity of neutral Ar. The density n e and temperature T e of free electrons are measured with an electrostatic probe.…”

Section: Introductionmentioning

confidence: 99%

Production of CH(A²Δ) radicals from the dissociative excitation reaction of C₂H₂with microwave discharge flow of Ar

Ito¹,

Tsudome²

2015

Jpn. J. Appl. Phys.

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Optical emission spectra of the CH(A2Δ–X2Π) transition were observed using the dissociative excitation reaction of C2H2 with the microwave discharge flow of Ar at the pressure of Ar, PAr, in the range of 0.20–0.40 Torr. The mechanism of the production of the CH(A2Δ) state was investigated by the following two methods. The first is the comparison of the PAr dependences of the emission intensity, of the intensity of the laser-induced fluorescence spectra of the 3P1–3P0 transition of Ar, and of the density and temperature of free electrons. The second is the steady-state chemical kinetic analysis with several assumptions of the relevant reaction rate constants. It was concluded that CH(A2Δ) radicals were formed by charge transfer from Ar+ followed by ion–electron recombination with the significant contribution of the impact of free electrons. Energetic considerations revealed that the ions participating in the recombination reaction are excited vibrational levels of C2H2+.

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Section: Introductionmentioning

confidence: 99%

Production of CH(A²Δ) radicals from the dissociative excitation reaction of C₂H₂with microwave discharge flow of Ar

Ito¹,

Tsudome²

2015

Jpn. J. Appl. Phys.

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Contribution of CN(X2Σ+) radicals to N atoms of hydrogenated amorphous carbon nitride films formed from the microwave discharge of the gas mixture of N2 and CH3CN

Ito

Mogi

Okada

et al. 2016

Diamond and Related Materials

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Real-time determination of combustion degree by laser-induced breakdown spectroscopy

Han,

Feng,

Tian

et al. 2024

Spectrochimica Acta Part B: Atomic Spectroscopy

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Mechanism of Production of CN(X2Σ+) Radicals from the Decomposition Reaction of CH3CN with Microwave Discharge Flow of Ar

Cited by 3 publications

References 38 publications

Production of CH(A²Δ) radicals from the dissociative excitation reaction of C₂H₂with microwave discharge flow of Ar

Production of CH(A²Δ) radicals from the dissociative excitation reaction of C₂H₂with microwave discharge flow of Ar

Contribution of CN(X2Σ+) radicals to N atoms of hydrogenated amorphous carbon nitride films formed from the microwave discharge of the gas mixture of N2 and CH3CN

Real-time determination of combustion degree by laser-induced breakdown spectroscopy

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Mechanism of Production of CN(X2Σ+) Radicals from the Decomposition Reaction of CH3CN with Microwave Discharge Flow of Ar

Cited by 3 publications

References 38 publications

Production of CH(A2Δ) radicals from the dissociative excitation reaction of C2H2with microwave discharge flow of Ar

Production of CH(A2Δ) radicals from the dissociative excitation reaction of C2H2with microwave discharge flow of Ar

Contribution of CN(X2Σ+) radicals to N atoms of hydrogenated amorphous carbon nitride films formed from the microwave discharge of the gas mixture of N2 and CH3CN

Real-time determination of combustion degree by laser-induced breakdown spectroscopy

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Production of CH(A²Δ) radicals from the dissociative excitation reaction of C₂H₂with microwave discharge flow of Ar

Production of CH(A²Δ) radicals from the dissociative excitation reaction of C₂H₂with microwave discharge flow of Ar