2007
DOI: 10.1063/1.2710000
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Mechanism of leakage current reduction of tantalum oxide capacitors by titanium doping

Abstract: In this letter, the authors will point out that defect states related to oxygen vacancies in tantalum oxide capacitors can be suppressed by titanium doping, resulting in significant leakage current reduction. The theory is that titanium forms an acceptor which can move at high temperature and neutralize other donors. However, defect states which cannot be suppressed by titanium doping were detected. These are explained by H2O-related contamination occurring at low temperature (<400°C) during the cooling… Show more

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Cited by 34 publications
(19 citation statements)
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“…For instance, Ta and Ti in La-Sr-Fe ͑LSF͒ oxides are interesting for catalytic oxygen membranes, 1 Ta is a hole depletion agent in photocatalysts, 2 and Ti suppresses leakage currents in high temperature tantalum capacitors. 3 The role of electron holes as charge carriers and their detection in the pre-edge of oxygen x-ray absorption spectra ͑XAS͒ has been recognized. But the pre-edges withstood quantitative treatment so far.…”
mentioning
confidence: 99%
“…For instance, Ta and Ti in La-Sr-Fe ͑LSF͒ oxides are interesting for catalytic oxygen membranes, 1 Ta is a hole depletion agent in photocatalysts, 2 and Ti suppresses leakage currents in high temperature tantalum capacitors. 3 The role of electron holes as charge carriers and their detection in the pre-edge of oxygen x-ray absorption spectra ͑XAS͒ has been recognized. But the pre-edges withstood quantitative treatment so far.…”
mentioning
confidence: 99%
“…It is also possible that other mechanisms may also exist to suppress the leakage current, as has been observed in the titanium doped tantalum oxide. Titanium doping was found to suppress the oxygen vacancies in tantalum oxide capacitors, which resulted in a significant reduction in the leakage current [38]. For the HfO 2 capacitors, there are also a considerable number of oxygen vacancies [39,40,41,42], which could potentially be suppressed when titanium is doped in the HfO 2 .…”
Section: Resultsmentioning
confidence: 99%
“…This can be seen in Fig. 2 (4). Let us name this mechanism of I-V symmetry by suppression of defect states as Mechanism A I-V symmetry.…”
Section: Mechanism a Symmetrymentioning
confidence: 94%