2005
DOI: 10.1103/physrevlett.94.016104
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Mechanism of Cu Deposition on theαAl2O3(0001) Surface

Abstract: The growth mechanism of the Cu= -Al 2 O 3 (0001) interface is studied by first-principles moleculardynamics simulations as a function of the transition-metal coverage ( ) and the temperature of the system. On the anhydrous surface growth of Cu(0) 3D clusters is predicted. On the partially hydroxylated surface, a Cu(I) monolayer, relatively stable upon the temperature rising, is first observed ( < 1=3 ML). Increasing Cu loading leads to Cu I =Cu 0 mixed phases that when heated aggregate into 3D particles increa… Show more

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Cited by 38 publications
(23 citation statements)
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“…Cu/a-Al 2 O 3 (0 0 0 1): Concerning Cu/a-Al 2 O 3 (0 0 0 1) interfaces, many experimental and theoretical efforts have been devoted to understand the metal-support interaction [35][36][37][38][39][40][41]. In particular, the role of surface OH on Cu growth has been studied extensively.…”
Section: The Interaction Of Metals With Surface Oh Groupsmentioning
confidence: 99%
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“…Cu/a-Al 2 O 3 (0 0 0 1): Concerning Cu/a-Al 2 O 3 (0 0 0 1) interfaces, many experimental and theoretical efforts have been devoted to understand the metal-support interaction [35][36][37][38][39][40][41]. In particular, the role of surface OH on Cu growth has been studied extensively.…”
Section: The Interaction Of Metals With Surface Oh Groupsmentioning
confidence: 99%
“…Due to the interaction between surface OH groups and metal adatoms [34][35][36][37][38] it is reasonable to assume the layer-like growth of the three metals on the hydroxylated surfaces. The interaction of every metal with surface OH was studied by XPS.…”
Section: The Interaction Of Metals With Surface Oh Groupsmentioning
confidence: 99%
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