Initial synthesis of semiconducting oxides leaves behind
poorly
controlled concentrations of unwanted atomic-scale defects that influence
numerous electrical, optical, and reactivity properties. We have discovered
through self-diffusion measurements and first-principles computations
that poison-free oxide surfaces inject interstitial oxygen atoms into
the crystalline solid when simply contacted with liquid water near
room temperature. These interstitials diffuse quickly to depths of
20 nm–2 μm and are likely to eliminate prominent classes
of unwanted defects or neutralize their action. The mild conditions
of operation access a regime for oxide fabrication that relaxes important
thermodynamic constraints that hamper defect regulation by conventional
methods at higher temperatures. The surface-based approach appears
well-suited for use with nanoparticles, porous oxides, and thin films
for applications in advanced electronics, renewable energy storage,
photocatalysis, and photoelectrochemistry.