Mechanism of bubbles formation and anomalous phase separation in the CoNiP system

Abstract

This study announces the anomalous phase separation in CoNiP alloy electroplating. The observed phenomenon of the formation of magnetic bubbles was described for the first time for this triple CoNiP system. This study briefly covers all stages of magnetic bubble formation, starting from the formation of an amorphous phosphor-rich sublayer, followed by nucleation centers, and finally cobalt-rich bubbles. An explanation for the anomalous mechanism of bubble formation was found in the effects of additives and the phenomena of depolarization and superpolarization.

Structure, magnetic, and electrodynamic properties of SrInxFe12‐xO4/Ni0.5Zn0.5Fe2O4 composites at low temperature

“…The FEI Titan ST Microscope and the JEOL JSM‐IT100 SEM and TEM were applied to image the microstructure. SmartSEM software was used for microstructure analysis 57,58 . The magnetic properties have been studied using the Tesla Quantum Design PPMS.…”

Ni–Co alloys via controlled pyrolysis of NiCo–MOF as heterogeneous hydrogenation catalysts

“…On the other hand, cheap metal alloys have been witnessed as potential metal nanoparticle materials, such as NiZn alloys, 21,22 NiFe alloys, 23 NiCoP alloys, 24 etc. , especially as heterogenous catalysts, which in some cases can overwhelm noble metal catalysts.…”

Optical, Electrical and Structural Properties of ITO/IZO and IZO/ITO Multilayer Transparent Conductive Oxide Films Deposited via Radiofrequency Magnetron Sputtering

“…These applications include thin-film transistors, solar cells, organic light-emitting diodes (OLEDs), flat-panel displays, liquidcrystal displays, and plasma display panels [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16]. Various techniques such as pulsed laser deposition, thermal evaporation, chemical vapor deposition, electron-beam evaporation, sol-gel deposition, ion beam-assisted deposition, and magnetron sputtering are utilized for depositing TCO films [3,4,[17][18][19]. Of these techniques, magnetron sputtering is widely employed due to its low substrate temperatures and high accumulation rates, as well as its suitability for industrial applications and its ability to ensure the excellent optoelectronic performance of the film [4,7].…”