2021
DOI: 10.1016/j.matchemphys.2021.124741
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Mechanical, tribological, anti-corrosion and anti-glass sticking properties of high-entropy TaNbSiZrCr carbide coatings prepared using radio-frequency magnetron sputtering

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Cited by 20 publications
(9 citation statements)
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“…MS is a process of depositing molten metal droplets on a target in a specific atmosphere through a magnetic field to form a thin film, as shown in Figure 13, which can significantly enhance wear, corrosion and high-temperature resistance of the parts. Although the disadvantages including lower target utilization and difficult preparation of magnetic materials exist [58][59][60], MS has become one of the most commonly used methods due to its high efficiency and low cost among thinfilms RHEA coating preparation methods. Kao et al [60] fabricated (TaNbSiZrCr)C x RHEA thin films using MS in a mixed atmosphere of Ar and C 2 H 2 .…”
Section: Deposition Techniquesmentioning
confidence: 99%
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“…MS is a process of depositing molten metal droplets on a target in a specific atmosphere through a magnetic field to form a thin film, as shown in Figure 13, which can significantly enhance wear, corrosion and high-temperature resistance of the parts. Although the disadvantages including lower target utilization and difficult preparation of magnetic materials exist [58][59][60], MS has become one of the most commonly used methods due to its high efficiency and low cost among thinfilms RHEA coating preparation methods. Kao et al [60] fabricated (TaNbSiZrCr)C x RHEA thin films using MS in a mixed atmosphere of Ar and C 2 H 2 .…”
Section: Deposition Techniquesmentioning
confidence: 99%
“…Although the disadvantages including lower target utilization and difficult preparation of magnetic materials exist [58][59][60], MS has become one of the most commonly used methods due to its high efficiency and low cost among thinfilms RHEA coating preparation methods. Kao et al [60] fabricated (TaNbSiZrCr)C x RHEA thin films using MS in a mixed atmosphere of Ar and C 2 H 2 . Hruška et al [61] deposited two HfNbTaTiZr RHEA films with thicknesses of 380 nm and 1650 nm on fused silica substrates by DC MS at room temperature, and found hard to avoid oxygen infiltration into HfNbTaTiZr films containing nanoscale open volumes favorable for hydrogen absorption, as shown in Figure 14.…”
Section: Deposition Techniquesmentioning
confidence: 99%
“…The NEC films with lower atomic mobility caused by the 'sluggish diffusion effect' showed more stable crystallisation than the TaWC films. The possibility of preparing HEC coatings by scattering HEA target was proved and reported [73,74]. To produce high entropy TiZrHfVNbTa carbide coatings, the high entropy TiZrHfVNbTa alloys were melted in a vacuum-arc in argon and used as a target [73].…”
Section: Hec Coatings and Filmsmentioning
confidence: 99%
“…The possibility of preparing HEC coatings by scattering HEA target was proved and reported [73,74]. To produce high entropy TiZrHfVNbTa carbide coatings, the high entropy TiZrHfVNbTa alloys were melted in a vacuum-arc in argon and used as a target [73].…”
Section: Preparation Of Hecsmentioning
confidence: 99%
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