Mechanical strength and thermally induced stress voids of carbon-coated optical fibers prepared by plasma enhanced chemical vapor deposition method with different hydrogen/methane ratio

Effect of substrate temperature on the properties of carbon-coated optical fibers prepared by plasma enhanced chemical vapor deposition

“…In addition, the excellent properties of carbon films have been applied to hermetic coatings on optical fibers. The carboncoated optical fiber is regarded as a key technology for optical transmission lines [3][4][5][6][7][8][9][10].…”

“…Besides sputtering techniques [11], ion beam deposition [12], and microwave plasma enhanced chemical vapor deposition [13], amorphous carbon films are often prepared by radio-frequency plasma enhanced chemical vapor deposition (rf-PECVD) with a high deposition rate and a low substrate temperature [7,10,14,15]. The amorphous carbon film prepared by rf-PECVD using a hydrocarbon as the precursor gas often contains a percentage of hydrogen, so it is usually classified as the hydrogenated amorphous carbon (a-C:H) film in the literature [2].…”

Effects of deposition parameters on characteristics of carbon coatings on optical fibers prepared by thermal chemical vapor deposition

“…Hence, if the thickness of the carbon coating is not smaller than 388 nm, the carbon coatings have the ability to sustain the thermal loading. When carbon films deposited on a silica glass fiber are used as hermetic coatings to resist water penetration, the surface of the carbon films should be as smooth as possible [2,7]. Consequently, if the carbon coating thickness is not smaller than 388 nm, a decrease of the CH 4 /(CH 4 + N 2 ) ratio is good for producing hermetic optical fiber coatings.…”

“…In these environments, the molecular diffusion rate through polymeric coatings increases, accelerating damage to these fibers. The use of carbon coatings on silica glass fibers greatly improves the reliability of fibers and protects them from attack by moisture, and thus the carbon-coated optical fiber is regarded as a key technology in optical transmission lines [2][3][4][5][6][7][8][9][10].…”

Effects of radio frequency powers on the characteristics of a-C:N/p-Si photovoltaic solar cells prepared by plasma enhanced chemical vapor deposition

“…Amorphous carbon films can be prepared at a low substrate temperature by using various methods, such as radio frequency plasma enhanced chemical vapor deposition (rf-PECVD) [5][6][7][8], plasma enhanced chemical vapor deposition with electron cyclotron wave resonance source [9], microwave plasma chemical vapor deposition [10], sputtering deposition [11], filtered cathodic vacuum arc deposition [12], and ion beam deposition [13]. Amorphous carbon films prepared by rf-PECVD using methane (CH 4 ) and nitrogen (N 2 ) as the precursor gases usually contain a percentage of C-N bonds, so it is classified as the nitrogenated amorphous carbon (a-C:N) film in the literature [14].…”