Mechanical Properties of Sputter-Deposited Nb₅Si₃ Film and Nb₅Si₃/Nb Microlaminates

Abstract

Monolithic Nb5Si3 films and microlaminates consisting of alternating, equally thick layers of Nb and Nb5Si3 were synthesized by magnetron sputtering. Thick monolithic Nb5Si3 films (25,000 nm) were deposited on a sapphire substrate to set process parameters and evaluate the microstructure and mechanical properties of as-deposited crystalline films. Nb5Si3/Nb micro-laminates with modulation wavelengths (i.e., bilayer thickness) of 40 and 200 nm were deposited on Nb substrates. Mechanical properties (elastic modulus, microhardness, compressive yield strength) of the films and microlaminates were studied using the nanoindentation method and Vickers microhardness. Mechanical property test results are presented.

Processing and High Temperature Properties of Nb/Nb5Si3 Laminates

“…This suggests that most of the NbsSia layer is still amorphous or at least fine grained, even at these high deposition temperatures. Rawal et al [7] have shown that depositing at 750°C resulted in crystalline NbsSis. However, this temperature range could not be obtained in our current deposition chamber.…”