2022
DOI: 10.1016/j.jallcom.2022.165808
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Mechanical, electrical properties and microstructures of combinatorial Ni-Mo-W alloy films

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Cited by 18 publications
(3 citation statements)
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“…Nickel-molybdenum-tungsten (Ni-Mo-W) films fabricated by sputter deposition displayed an unprecedented tensile strength (∼3 GPa) and microstructural stability. Followup studies attempted to verify the potential of Ni-Mo-W thin film as a structural material by preparing the sample at a much lower deposition rate, 29,30 measuring the thermal expansion coefficient 31 and electrical resistance, 32 assessing the thermal stability with an in situ transmission electron microscopy (TEM) study, 33 and fabricating micro-cantilever beams. 34 For a complete reliability evaluation, the fatigue resistance of Ni-Mo-W thin films must be understood.…”
Section: Introductionmentioning
confidence: 99%
“…Nickel-molybdenum-tungsten (Ni-Mo-W) films fabricated by sputter deposition displayed an unprecedented tensile strength (∼3 GPa) and microstructural stability. Followup studies attempted to verify the potential of Ni-Mo-W thin film as a structural material by preparing the sample at a much lower deposition rate, 29,30 measuring the thermal expansion coefficient 31 and electrical resistance, 32 assessing the thermal stability with an in situ transmission electron microscopy (TEM) study, 33 and fabricating micro-cantilever beams. 34 For a complete reliability evaluation, the fatigue resistance of Ni-Mo-W thin films must be understood.…”
Section: Introductionmentioning
confidence: 99%
“…In this work, combinatorial synthesis of nanostructured W-Ta, W-Re, and W-Re-Ta thin films was carried out to produce specimens with composition spreads. We then employed combinatorial and high-throughput experiments (HTEs) to investigate irradiation damages of the materials library [31][32][33][34]. The irradiation damage behaviors with respect to composition and microstructure were characterized by mechanical, thermal, and structural properties of the combinatorial samples.…”
Section: Introductionmentioning
confidence: 99%
“…To overcome these shortcomings of Ni-W thin films, the recent sputtering of Ni-Mo-W ternary films with no more than 6 at.% W additions, showing an extraordinary balance of strength and toughness, underpinned by the formation of the growth of nano-twins [20,21]. Due to this suite of properties, Ni-Mo-W films possess a lower and tailorable coefficient of thermal expansion [22] and are compatible with the wafer-level manufacturability of metal MEMS devices [23]. In addition, recent research focuses on the use of the ternary formulation of the Ni-Mo-W catalyst with improved hydrogenation functions [24,25].…”
Section: Introductionmentioning
confidence: 99%