“…Nanocomposite coatings of the Ti-B-C-N system can be obtained by a variety of methods, such as dc or rf reactive (in the mixture of argon and nitrogen gases) magnetron sputtering of TiB 2 /TiC composite target [7], Ti/B 4 C compound target [8], separate C, Ti, and TiB 2 targets [9], separate C, Ti, and B 4 C targets [10], single Ti and TiB 2 targets (in this case sputtering is carried out in the mixture of argon, nitrogen, and acetylene gases) [11]. The methods of cathodic arc plasma evaporation [9] and CVD (in which various precursors are used) [13][14][15] have also been applied for deposition of coatings of the Ti-B-C-N system.…”