2015
DOI: 10.1063/1.4937582
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Measurements of Schottky barrier at the low-k SiOC:H/Cu interface using vacuum ultraviolet photoemission spectroscopy

Abstract: The band alignment between copper interconnects and their low-k interlayer dielectrics is critical to understanding the fundamental mechanisms involved in electrical leakage in low-k/Cu interconnects. In this work, vacuum-ultraviolet (VUV) photoemission spectroscopy is utilized to determine the potential of the Schottky barrier present at low-k a-SiOC:H/Cu interfaces. By examining the photoemission spectra before and after VUV exposure of a low-k a-SiOC:H (k = 3.3) thin film fabricated by plasma-enhanced chemi… Show more

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Cited by 4 publications
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“…SiOC polymer‐derived ceramics (PDCs) have attracted enormous attention for years due to a variety of unique and superior properties, including excellent thermal stability in oxidative and corrosive environments, high strength and creep resistance, and unusual electric behavior . However, fabrication of porous SiOC in a stable shape poses considerable challenge due to the difficulties of keeping the materials undamaged during drying and pyrolysis.…”
Section: Introductionmentioning
confidence: 99%
“…SiOC polymer‐derived ceramics (PDCs) have attracted enormous attention for years due to a variety of unique and superior properties, including excellent thermal stability in oxidative and corrosive environments, high strength and creep resistance, and unusual electric behavior . However, fabrication of porous SiOC in a stable shape poses considerable challenge due to the difficulties of keeping the materials undamaged during drying and pyrolysis.…”
Section: Introductionmentioning
confidence: 99%