Measurements of electron temperature in a capacitively coupled plasma using emission spectroscopy

Felts, J.; Lopata, Eugene S.

doi:10.1116/1.575599

Cited by 11 publications

(8 citation statements)

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“…OES can be used to obtain e.g. mean electron energies (22,23) and concentrations of certain particles in plasma (24,25,26). OES is one of the few in situ techniques to investigate the influence of silane on the parameters of Ar and/or Ar-N 2 /N 2 O plasmas.…”

Section: Table Imentioning

confidence: 99%

Langmuir-probe Characterization of an Inductively-Coupled Remote Plasma System intended for CVD and ALD

Boogaard¹,

Kovalgin²,

Aarnink³

et al. 2007

ECS Trans.

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We measured electron density and electron energy distribution function (EEDF) vertically through our reactor for a range of process conditions and for various gases. The EEDF of Ar plasma in the reactor could largely be described by the MaxwellBoltzmann distribution function, but it also contained a fraction (~10 -3 ) of electrons which were much faster (20-40 eV). At low pressures (6.8-11 µbar), the tail of fast electrons shifted to higher energies (E max ~ 50 eV) as we measured more towards the chuck. This tail of fast electrons could be shifted to lower energies (E max ~ 30 eV) when we increased pressure to 120 µbar or applied an external magnetic field of 9.5 µT. Addition of small amounts of N 2 (1-10%) or N 2 O (5%) to Ar plasma lowered the total density of slow electrons (approx. by a factor of two) but did not change the shape of the fast-electron tail of the EEDF. The ionization degree of Ar-plasma increased from 2.5·10 -4 to 5·10 -4 when an external magnetic field of 9.5 µT was applied. Motivation

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Section: Table Imentioning

confidence: 99%

Langmuir-probe Characterization of an Inductively-Coupled Remote Plasma System intended for CVD and ALD

Boogaard¹,

Kovalgin²,

Aarnink³

et al. 2007

ECS Trans.

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“…Under non-equilibrium plasma conditions, emission intensities from two rare gas (e.g. Ar) levels of differing energy are sometimes used to obtain T e [29][30][31][32][33][34]. Often the two levels are of the neutral and the ion of the same atomic species.…”

Section: Introductionmentioning

confidence: 99%

Plasma electron temperatures and electron energy distributions measured by trace rare gases optical emission spectroscopy

Donnelly¹

2004

J. Phys. D: Appl. Phys.

227

199

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This article reviews a spectroscopic method for extracting plasma electron temperatures and electron energy distributions: trace rare gases optical emission spectroscopy. Specifically, traces of Ne, Ar, Kr, and Xe are added to the plasma and the intensities of emissions from the Paschen 2p levels are recorded. Intensities are also computed from a model that includes direct excitation from the ground state, as well as two-step excitation through the 3P2, and 3P0 metastable levels. A Maxwellian electron energy distribution function (EEDF), described by an electron temperature (Te), is assumed, and Te is extracted from the best match between the observed and calculated relative emission intensities. By choosing emission from specific sets of levels, the range of electron energies effective in exciting emission can be selected and various portions of the EEDF can be investigated. Accurate measurement of Te depends critically on accurate cross sections for electron impact excitation, and hence a large portion of this article is devoted to a critical review of this subject. Improving on previous treatments, the model for computing emission intensities and electron temperatures includes a complete analysis of the complex excitation and de-excitation of the metastable levels. Previous measurements of Te and EEDFs in chlorine and oxygen inductively coupled plasmas are re-evaluated with the current model. In general, the current version of the model yields similar results; specific differences are discussed.

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“…, and T e is in electron volts. A slightly different relation has been proposed relatively recently by Suzuki and Nobata (1986) but, unfortunately, it contains an undefined proportionality constant which can be obtained only using a complementary diagnostic technique (Felts and Lopata 1988). For obtaining the electron temperature T e in the experimental conditions here, where use of the probe technique is not possible, we consider relation (5).…”

Section: Experiments and Methodsmentioning

confidence: 99%

Measurements of electron temperature in radio frequency capillary helium glow discharges

Toader

1996

J. Phys. D: Appl. Phys.

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Non invasive emission spectroscopy is used to measure the electron temperature in a radio frequency driven (28.4 - 36.6 MHz) capillary (r=0.8 mm) helium discharge plasma column, over the pr range (the product of the pressure p and the inside tube radius r) from to Torr cm. The results show that decreases significantly with increasing pr and is weakly dependent on frequency. The values of are few times lower than those reported in the case of low-pressure, capillary direct current helium discharges.

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Measurements of electron temperature in a capacitively coupled plasma using emission spectroscopy

Cited by 11 publications

References 0 publications

Langmuir-probe Characterization of an Inductively-Coupled Remote Plasma System intended for CVD and ALD

Langmuir-probe Characterization of an Inductively-Coupled Remote Plasma System intended for CVD and ALD

Plasma electron temperatures and electron energy distributions measured by trace rare gases optical emission spectroscopy

Measurements of electron temperature in radio frequency capillary helium glow discharges

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