1998
DOI: 10.1007/978-3-642-72289-9_193
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Measurements and Theoretical Modelling of Ultrafast Heterogeneous Spacer-Controlled Electron Transfer

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Cited by 12 publications
(24 citation statements)
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“…Competition of Electron Injection and Vibrational Relaxation. In addition to the Ru dye-sensitized TiO 2 , ,,,,, ultrafast electron injection on the 100 fs or faster time scale from various sensitizers to TiO 2 has also been reported in recent years. ,,,,, An injection process on the <100 fs time scale is comparable to or faster than the vibrational energy relaxation within the excited states of the molecules. , It implies that injection may occur from vibrationally excited states instead of the minimum in the excited-state manifold as was previously thought. To directly demonstrate the competition between electron injection and excited-state relaxation pathways and its effect on injection dynamics, we have investigated the following systems:…”
Section: Ultrafast Electron Injection Dynamicsmentioning
confidence: 79%
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“…Competition of Electron Injection and Vibrational Relaxation. In addition to the Ru dye-sensitized TiO 2 , ,,,,, ultrafast electron injection on the 100 fs or faster time scale from various sensitizers to TiO 2 has also been reported in recent years. ,,,,, An injection process on the <100 fs time scale is comparable to or faster than the vibrational energy relaxation within the excited states of the molecules. , It implies that injection may occur from vibrationally excited states instead of the minimum in the excited-state manifold as was previously thought. To directly demonstrate the competition between electron injection and excited-state relaxation pathways and its effect on injection dynamics, we have investigated the following systems:…”
Section: Ultrafast Electron Injection Dynamicsmentioning
confidence: 79%
“…Martini et al , reported a <200 fs electron injection time for 9-anthracene-sensitized anatase TiO 2 nanoparticles. Burfeindt et al , studied modified perylene-sensitized TiO 2 thin films in an ultrahigh vacuum chamber. A 190 fs electron injection time was first reported 58 and a more recent measurement with improved time resolution yielded a 75 fs electron injection time .…”
Section: Ultrafast Electron Injection Dynamicsmentioning
confidence: 99%
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“…For this system heterogeneous ET ͑into the semiconductor͒ which proceeds on a 100 fs time scale has been observed, 35,36 and can be well simulated in models which will be used here, too. [37][38][39] Although we have such a system in mind, the present studies concentrate on the models given in Fig.…”
Section: Introductionmentioning
confidence: 99%