1996
DOI: 10.1007/bf01046985
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Measurement of the stress in oxide scales formed by oxidation of alumina-forming alloys

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Cited by 286 publications
(117 citation statements)
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“…14,20) The formed TGO layer is assumed to be a polycrystalline Al 2 O 3 and isotropic with quite a low Cr content (<0:5 mass%).…”
Section: Stress Measurement In Tgo Layermentioning
confidence: 99%
“…14,20) The formed TGO layer is assumed to be a polycrystalline Al 2 O 3 and isotropic with quite a low Cr content (<0:5 mass%).…”
Section: Stress Measurement In Tgo Layermentioning
confidence: 99%
“…The specimen was oxidized in air at 11218C for successively longer periods of time (1,2,4,8,16, 32 h). After each oxidation the sample was cooled to room temperature and the photostimulated Cr 3+ uorescence (luminescence) spectrum recorded.…”
Section: Residual Stress Evolution On Oxidationmentioning
confidence: 99%
“…All studies on NiAl showed initial tensile stresses related to the phase transformation from transition alumina to alpha. After this transformation is complete, the stress is near zero [10,15] or slightly compressive (-80 MPa) [11], except a recent in-situ XRD study done at 950 o C, which found 500 MPa tensile stress [8]. The effect of a reactive element, Hf, was to reduce the small compressive growth stress to zero [11], or raise the tensile stress from 500 to 600 MPa [8].…”
mentioning
confidence: 99%
“…All deflection results showed initially high compressive growth stresses (from -250 to -900 MPa) [5][6][7], and levels deduced from room temperature residual stress measurements ranged from (-0.3 to -1.8 GPa) [9,15,16]. A study of room temperature stress levels coupled with specimen length change found high tensile (1.2 GPa) or low compressive (-0.1 GPa) growth stresses during the initial stage of oxidation (0.1 hr) at 1000 o C, but the stresses were all compressive (up to -1.2 GPa) after longer times at 1000 o C and at all times at higher temperatures.…”
mentioning
confidence: 99%