1960
DOI: 10.1063/1.1717065
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Measurement of the Sheet Resistivity of a Square Wafer with a Square Four-Point Probe

Abstract: The sheet resistivity of a thin sample of semiconductor may be measured by the placement of four probes on the surface of the sample. When current is passed between two of the probes, the potential difference between the other two probes is proportional to the current and the sheet resistivity of the sample. Sheet resistivity is then proportional to PD÷current, the proportionality or correction factor being dependent on the geometry of the sample and the probe. Calculations have been made for the correction fa… Show more

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Cited by 35 publications
(11 citation statements)
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“…This observation may be used in the assessment of the validity of this theory. Equation ( 9) is similar to some equations that have previously been derived for different conditions (Sun et al, 1992;Keywell and Dorosheski, 1960).…”
Section: J2%rhsupporting
confidence: 61%
“…This observation may be used in the assessment of the validity of this theory. Equation ( 9) is similar to some equations that have previously been derived for different conditions (Sun et al, 1992;Keywell and Dorosheski, 1960).…”
Section: J2%rhsupporting
confidence: 61%
“…The sheet resistance R s (Ω per square) of the ALD ITO film deposited on 100 nm SiO 2 -Si substrate was determined by a four-point probe. The film resistivity was calculated by ρ (Ω cm) = R s × t, [40] where t is the film thickness obtained from XRR.…”
Section: Methodsmentioning
confidence: 99%
“…An early attempt to solve this problem [90] was incorrect because the solution does not approach the van der Pauw [91] solution for the case where the probes are on the periphery of the specimen.…”
Section: Square Array Collector Resistormentioning
confidence: 99%